Paradigms of Maskless Lithography, IEEE Lithography Workshop: 1999

Summary : The replacement of optical lithography with e-beam direct write for semiconductor manufacturing has been predicted since Gordon Moore penned his 1965 paper, writing "It is worth noting that this density of components can be achieved by present optical techniques and does not require the more exotic electron beam operations which are being studied for the possibility of making even smaller structures." This paper showed why it never happened.

























You may like this also:

Access to and use of this Website is subject to VLSI's Terms of Use (including Copyright Policy & Claims) and Privacy Policy. By accessing or using this Website you agree to VLSI's Terms of Use (including Copyright Policy & Claims) and Privacy Policy.

Copyright © 2020 VLSI Research Inc. All rights reserved.