Paradigms of Maskless Lithography, IEEE Lithography Workshop: 1999

Summary : The replacement of optical lithography with e-beam direct write for semiconductor manufacturing has been predicted since Gordon Moore penned his 1965 paper, writing "It is worth noting that this density of components can be achieved by present optical techniques and does not require the more exotic electron beam operations which are being studied for the possibility of making even smaller structures." This paper showed why it never happened.

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