Paradigms of Maskless Lithography, IEEE Lithography Workshop: 1999

Summary : The replacement of optical lithography with e-beam direct write for semiconductor manufacturing has been predicted since Gordon Moore penned his 1965 paper, writing "It is worth noting that this density of components can be achieved by present optical techniques and does not require the more exotic electron beam operations which are being studied for the possibility of making even smaller structures." This paper showed why it never happened.

IEEE Lithography Workshop - Historical Prespective

IEEE Lithography Workshop - Historical Prespective E-Beam

IEEE Lithography Workshop - Economics of Direct Write

IEEE Lithography Workshop - 1974-2004 History & Forcast

IEEE Lithography Workshop - Economics of Direct Write E-beam Mythology

IEEE Lithography Workshop - Economics of Direct Write Data Complxity

IEEE Lithography Workshop - Economics of Direct Write Computional Requirements

IEEE Lithography Workshop - Economics of Direct Write in 1999

IEEE Lithography Workshop - Economics of Direct Write in 2005

IEEE Lithography Workshop - Economics of Direct Write E-Beam

IEEE Lithography Workshop - Practical & Cultural Barriers

IEEE Lithography Workshop - Practical & Cultural Barriers Fear

IEEE Lithography Workshop - Practical & Cultural Barriers Yield

IEEE Lithography Workshop - Practical & Cultural Barriers There's Lots of Competition

IEEE Lithography Workshop - Practical & Cultural Barriers Optical Lithography's History

IEEE Lithography Workshop - Practical & Cultural Barriers Optical Lithography's Future

IEEE Lithography Workshop - Concludions Next Generation Lithography

Moore's Law: Original D ...

19 Apr 1965

The Future of Integrated Electronics draft, written by Dr. Gordon E. Moore for Electronics Magazine while he worked at Fairchild Semiconductor. This seminal paper would prove to be one of the most important pap ... See more

Silicon Valley Genealog ...

AMD's and Intel's can be traced back to Fairchild and Shockley Transistor with this genealogy of semiconductor start-ups in Silicon Valley. The poster was created by SEMI poster. It shows the history of semicon ... See more

John Bardeen and Transi ...

25 Apr 2007

John Bardeen and Transistor Physics by Howard R. Huff, International SEMATECH ... See more

Silicon and the Microel ...

The emergence of crystalline silicon and silicon-based material such as silicon-germanium as the premier material and the personnel driving the integrated circuit (IC) microelectronics revolution will be review ... See more

Environmental Health an ...

15 Sep 1994

The semiconductor industry has always worked hard to have and to maintain extremely high health and safety levels. ... See more

Introduction to Wafer F ...

Wafer fabrication equipment consists of all those types of equipment used in making and processing raw wafers in forming the finished chips-whether they be discretes or integrated circuits. This segment also in ... See more

Process Diagnostics - D ...

Process diagnostic equipment is critical to semiconductor manufacture. Though this equipment is not used to directly manufacture devices, it serves to verify consistent and in-control manufacturing processes. ... See more

Introduction to Questor ...

Questor systems consist of those types of equipment used in the design, verification, handling, inspection and test of integrated circuits. This equipment, although critical in assuring device design or design ... See more

Equipment Suppliers - 1 ...

This section examines the vendors who supply semiconductor manufacturing equipment. There are approximately 534 of them. The top five are shown below in Figure 2.0.0-1. In 1989, these five companies held a 26 ... See more

Paradigms of Maskless Lithography, IEEE Lithography Workshop: 1999

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