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- Key Contributors: Joseph A. Maher Jr., Art Zafiropoulo†
†Winner of the Bob Graham Award for Marketing Excellence in 2000
- Industry code: 1473.333
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- Mfr’s Code: LAM
Dry etching had not yet come into its own back in 1981. Barrel Etchers had been in use for almost five years but were successful mostly when used as ashers to remove photoresist, but they were isotropic. The early eighties would be all about developing planar etchers that were anisotropic, so they could etch fine patterns in films. The Drytek DRIE 100 plasma etcher had multiple chambers and would become the template for all cluster tools that followed, starting in 1987.