In the News: Technology, Crica 1981

Organization Name :KLA-TencorTime Period :1980'sRelevant Date :1981-06-01

Summary : This technical paper laid out the future of yield management, covering all the issues the industry faced with defects and gave a vision for resolving them. It became the foundation on which KLA was built. Published sometime in 1981, it is a landmark in visionary work.

Tencor at 20 Years

Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconductor equipment industry. It developed many products that were essential to chip manufacturing. Some are still made today. ... See more

KLA 200 Series Reticle ...

15 Jun 1984

KLA's Reticle Inspection System was the first automatic inspection system to ensure that killer defects as small as 0.7 microns on both reticles and photomasks would be detected. ... See more

KLA-Tencor - KLA 2020

30 Jun 1985

The tool that sparked the yield management revolution. ... See more

KLA Conquers the Pellic ...

16 Nov 1981

Technology, Circa 1981 – It's often the overlooked news that turn out to be critical turning points. The pellicle was one such event. Being able to inspect them was even more critical and a large barrier to o ... See more

KLA Conquers Phase Shif ...

20 May 1991

Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask. ... See more

KLA-Tencor - KLA ADD/10 ...

01 Jan 1980

The dawn of automated inspection. KLA's mask inspection tools took over to see what humans could not, launching what would become a great company by pushing barriers aside. ... See more

Varian - VLS 1000 Elect ...

30 Jun 1985

Remember when Varian was in the lithography business? You dont? Well, this was one of the top e-beam direct exposure systems in the early eighties. ... See more

Ultratech - Pellicle Eq ...

Ultratech - Pellicle Equipment and Accessories - To implement the use of pellicle protected masks for projection aligners and steppers ... See more

JEOL - JBX-6A Electron ...

30 Jun 1985

A 6th gen maskless litho tool from the early 80's. ... See more

IMS - Ion Beam Exposure ...

30 Jun 1985

The push for sub-micron line features sprouted several experimental attempts, among them X-Ray, e-beam, optical steppers and ion beam machines. ... See more

In the News: Technology, Crica 1981

You may like this also:

Tencor at 20 Years

KLA 200 Series Reticle ...

KLA-Tencor - KLA 2020

KLA Conquers the Pellic ...

KLA Conquers Phase Shif ...

KLA-Tencor - KLA ADD/10 ...

Varian - VLS 1000 Elect ...

Ultratech - Pellicle Eq ...

JEOL - JBX-6A Electron ...

IMS - Ion Beam Exposure ...