In the News: Technology, Crica 1981

Organization Name :KLA-TencorTime Period :1980'sRelevant Date :1981-06-01

Summary : This technical paper laid out the future of yield management, covering all the issues the industry faced with defects and gave a vision for resolving them. It became the foundation on which KLA was built. Published sometime in 1981, it is a landmark in visionary work.

Tencor at 20 Years

Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconductor equipment industry. It developed many products that were essential to chip manufacturing. Some are still made today. ... See more

KLA 200 Series Reticle ...

15 Jun 1984

KLA's Reticle Inspection System was the first automatic inspection system to ensure that killer defects as small as 0.7 microns on both reticles and photomasks would be detected. ... See more

KLA-Tencor - KLA 2020

30 Jun 1985

The tool that sparked the yield management revolution. ... See more

KLA Conquers the Pellic ...

16 Nov 1981

Technology, Circa 1981 – It's often the overlooked news that turn out to be critical turning points. The pellicle was one such event. Being able to inspect them was even more critical and a large barrier to o ... See more

KLA Conquers Phase Shif ...

20 May 1991

Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask. ... See more

KLA-Tencor - KLA ADD/10 ...

01 Jan 1980

The dawn of automated inspection. KLA's mask inspection tools took over to see what humans could not, launching what would become a great company by pushing barriers aside. ... See more

Bunny Suit History in S ...

24 May 2018

In 1968, standard clean room practices were lax. Facilities were kept reasonably clean, but employees wore their own clothes and the environment was not sterile. An early technician remembered “a couple of pe ... See more

RVSI - WS-1000 Bumped W ...

31 Dec 1969

High Throughput Bumped Wafer Characterization System ... See more

Yan Borodovsky with a d ...

19 Sep 2007

Yan Borodovsky demonstrates what was new in DFM and Computational Lithography at Intel in this historic 2007 interview. In this video, Yan Borodovsky, follows up on the first interview with a demonstration that ... See more

APT - 9155 E-Beam Resis ...

APT - 9155 E-Beam Resist Processor :1985-89 ... See more