Summary : Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask.
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
This technical paper laid out the future of yield management, covering all the i ...
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
The tool that sparked the yield management revolution.
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
Applied Materials - P5000, Etcher :1985-89 - Followed the 8300, but was eclipsed ...
Not many commercial machines get more exotic than this. It even looks like somet ...
The launch of Intel’s Centrino in 2003 marks move that took laptop PCs into th ...
Ultratech - Model 504 Resist Develop/Rinse System - Positive photo resist Develo ...
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