Summary : Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask.
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
This technical paper laid out the future of yield management, covering all the i ...
The tool that sparked the yield management revolution.
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
Just as the first lights of a new millennium were dawning in 1999, ASML announce ...
The first commercial American X-ray lithography system.
Applied Materials - SPCVD-4000 :1960s - An LPCVD tool from a time when Applied c ...
In 1998, IBM and Novellus caught the world off-guard when they announced they we ...
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