Summary : Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask.
The tool that sparked the yield management revolution.
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
This technical paper laid out the future of yield management, covering all the i ...
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
FSI - Polaris, Coating System :1990s
You have to make capital investment decision to secure availability of monocryst ...
Gordon Moore and Andy Grove talk about Intel’s history.
As semiconductor geometry device continues to shring, positive resist systems ar ...
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