Summary : Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask.
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
This technical paper laid out the future of yield management, covering all the i ...
The tool that sparked the yield management revolution.
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
Canon - FPA-5000 ES2 Aligner :1990s - An early DUV scanner.
Barry Rapozo was honored for the establishment of selling processes in wafer fab ...
Not the first such system, but near the first.
Microlite 150 Series Photostabilizer Systems provide a clean one-step process fo ...
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