Summary : Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask.
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
This technical paper laid out the future of yield management, covering all the i ...
The tool that sparked the yield management revolution.
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
Canon - FPA-3000 EX4 Aligner :1990s
Not the first such system, but near the first.
The 8251 single cassette, horizontal, on-center clean machine features the high ...
Ed Segal was honored for his establishment of a global representative organizati ...
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