Summary : Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask.
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
This technical paper laid out the future of yield management, covering all the i ...
The tool that sparked the yield management revolution.
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
Introducing Micrascan III+ for Critical Level Lithography
You have to make capital investment decision to secure availability of monocryst ...
Electronic Visions - EV150 Resist Processing System :1990s
Most assume it has been paint by the numbers for Intel, since IBM first selected ...
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