Summary : Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask.
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
This technical paper laid out the future of yield management, covering all the i ...
The tool that sparked the yield management revolution.
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
How the SIA got started is an video interview with the legendary Wilf Corrigan w ...
The SUSS ACS200 Microlithography Cluster offers superior process performance and ...
The Drytek DRIE 100 plasma etcher was the template for all cluster tools that wo ...
The second part of this three-part interview covers Applied Materials in the 198 ...
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