Summary : Technology, Circa 1981 – It's often the overlooked news that turn out to be critical turning points. The pellicle was one such event. Being able to inspect them was even more critical and a large barrier to overcome.
This technical paper laid out the future of yield management, covering all the i ...
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
The tool that sparked the yield management revolution.
Technology, Circa 1991 – As lithography moved into ever lower k factors, the c ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
Significant improvement in manufacturing worthiness for the first Step-and-Scan ...
An early excimer laser stepper for 0.45 micron.
Ultratech - Model 504 Resist Develop/Rinse System - Positive photo resist Develo ...
Deep UV 40KX ULTRACURE Photoresist Stabilization Sytsem
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