Canon - FPA-3000 EX4 Aligner

Canon - PLA 501F/FA Pro ...

30 Jun 1975

Proximity aligners were a bridge tool between the original contact aligners and projection aligners. Yield from contact aligners was extremely low, mainly because the mask was just a stencil laying over the pho ... See more

Canon - Various models ...

Canon - Various models of Mask Aligners :1980-84 - The only company to offer all 3 types of litho tools. ... See more

Canon - FPA-5000 ES2 Al ...

Canon - FPA-5000 ES2 Aligner :1990s - An early DUV scanner. ... See more

Canon - Model FPA141 Pr ...

30 Jun 1985

Though not as elegantly encased as the Perkin-Elmer 100, here was Japan’s answer to the threatening storms of the projection aligner revolution. ... See more

Applied Materials - End ...

Applied Materials - Endura 5500 PVD :1985-89 - The first bullet-proof multichamber, multiprocess system. ... See more

KLA 200 Series Reticle ...

15 Jun 1984

KLA's Reticle Inspection System was the first automatic inspection system to ensure that killer defects as small as 0.7 microns on both reticles and photomasks would be detected. ... See more

Mix & Match Photoresist ...

30 Jun 1985

In the early eighties virtually every company was seeking entry into the equipment business, or expanding into it via acquisitions. It was the same with Veeco, the Vacuum Equipment Company. ... See more

RVSI - WS-1000 Bumped W ...

31 Dec 1969

High Throughput Bumped Wafer Characterization System ... See more

GCA XLS - Advanced Micr ...

The failure that was supposed to save the U.S. lithography infrastructure. It was simply a case of too little, too late. ... See more

Uniplane System 4000 Hi ...

The versatile programmability of Kasper's System 4000 High Pressure Scrubber allows semiconductor wafers to be decontaminated by brush scrubbing. ... See more