Electroglas - Model 3001 Wafer Prober System

30 Jun 1965

The elegant simplicity of this small machine belies the fact that an earlier anc ...

30 Jun 1975

It broke the 1 micron CD barrier.

Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...

13 Sep 2007

Ever wonder how innovation really happens? Think it's someone sitting back and d ...

30 Jun 1965

Here is an excellent view of a state-of-the-art diffusion furnace from the mid 1 ...

The SUSS ACS200 Microlithography Cluster offers superior process performance and ...

30 Jun 1975

This photo from the AI 400 series high energy implanters is one of the earliest ...

Applied Materials - Precision Etch 8300 :1985-89 - The extension of the blockbus ...

CONVAC Module 6000 Series photo-lithographic process equipment meets the most st ...

31 Dec 1969

High Throughput Bumped Wafer Characterization System