Cameca - XPWS 301 Proximity Step and Repeat System

Organization Name :Cameca

Summary : Cameca - XPWS 301 Proximity Step and Repeat System :1980-84 - Thompson’s x-ray spin-off.

Cameca - ARW Aligner Re ...

30 Jun 1985

Cameca was a European based attempt from the research department of Thomson CSF to penetrate the new wafer stepper lithography market. ... See more

Cameca - 600 Series Ste ...

Cameca - 600 Series Steppers :1980-84 ... See more

KLA 200 Series Reticle ...

15 Jun 1984

KLA's Reticle Inspection System was the first automatic inspection system to ensure that killer defects as small as 0.7 microns on both reticles and photomasks would be detected. ... See more

SRC 25th Anniversary

01 Jun 2007

The history and accomplishments of the Semiconductor Research Corporation ... See more

Barry Rapozo was honored for the establishment of selling processes in wafer fab. He identified and met our industry specific customer needs and brought these selling processes into theindustry. ... See more

Cambridge Instruments - ...

Cambridge Instruments - EBML 300 :1985-89 - Maskless Lithography from twenty years ago. ... See more

Anantha Sethuraman: Cop ...

In 1998, IBM and Novellus caught the world off-guard when they announced they were ready for copper. While most of the industry was chiming in to not look behind, behind the scenes they were scrambling to make ... See more

JSR - Plasmaster-Si, Si ...

Plasmaster-Si is a silylation track specially dedicated to the Desire process. ... See more

Semiconductor Systems - ...

The 8050 yields consistent, repeatable wafer-to-wafer results, providing maximum throughput within a minimum footprint. ... See more

Excerpt from 1999 Annua ...

Long regarded as technology leader in etch, Lam took additional aggressive steps in fiscal 1999 to position the Company for success and to gain market share ... See more