Cameca - XPWS 301 Proximity Step and Repeat System

Organization Name :Cameca

Summary : Cameca - XPWS 301 Proximity Step and Repeat System :1980-84 - Thompson’s x-ray spin-off.

Cameca - ARW Aligner Re ...

30 Jun 1985

Cameca was a European based attempt from the research department of Thomson CSF to penetrate the new wafer stepper lithography market. ... See more

Cameca - 600 Series Ste ...

Cameca - 600 Series Steppers :1980-84 ... See more

Virtually everyone seemed to be entering the semiconductor capital equipment business in the early eighties. An entourage of government bodies, both foreign and domestic, as well as interested but alien busines ... See more

ASML - PAS 2500 Series ...

30 Jun 1985

The system that built the company. ... See more

Applied Materials Serie ...

30 Jun 1975

The system that built the company. ... See more

GCA - Model 8000 DSW Wa ...

To stay ahead of your competition in the world of one micron production and the 1Mbit DRAM you need the brilliant performance of microlithography's brightest new star - the Model 8000 DSW system from GCA. ... See more

Ultratech Stepper - Sat ...

Saturn wafer stepper Advancing Mix-and-Match Lithography ... See more

The Bob Graham Award

29 Nov 2004

What About Bob - Robert Graham's video biography of his career with comments about him, sometimes roasting him, from industry luminaries such as Gordon Moore, Marshall Cox, Mel Phelps, and G. Dan Hutcheson. ... See more

Semiconductor Systems - ...

Semiconductor Systems' new System 200 is state-of-the-art equipment for submicron lithography that is designed for the greatest flexibility now, and in the future. ... See more

Toshiba - Space Linear ...

Toshibas advanced control technique created this highly innovative system ... See more