Cameca - XPWS 301 Proximity Step and Repeat System

Organization Name :Cameca

Summary : Cameca - XPWS 301 Proximity Step and Repeat System :1980-84 - Thompson’s x-ray spin-off.

Cameca - ARW Aligner Re ...

30 Jun 1985

Cameca was a European based attempt from the research department of Thomson CSF to penetrate the new wafer stepper lithography market. ... See more

Cameca - 600 Series Ste ...

Cameca - 600 Series Steppers :1980-84 ... See more

MRC - Series 900 In-Lin ...

30 Jun 1975

The semiconductor industry was plunging rapidly into alloy deposition to overcome many separate problems. ... See more

Auto Etch 590 Oxide Etc ...

The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode. ... See more

RC8-RC33 Spin Coaters: ...

SUSS spin coaters combine state of the art technology with an innovative concept. ... See more

Cambridge Instruments - ...

Cambridge Instruments - EBML 300 :1985-89 - Maskless Lithography from twenty years ago. ... See more

Yan Borodovsky demonstrates what was new in DFM and Computational Lithography at Intel in this historic 2007 interview. In this video, Yan Borodovsky, follows up on the first interview with a demonstration that ... See more