Censor - SRA-100 Mask Aligner

Organization Name :Censor

Summary : Censor - SRA-100 Mask Aligner :1970s - Backed by Porsche and Gordon Moore and it still went wrong.

IBM’s development of ...

22 Sep 1997

IBM was first with copper interconnect for semiconductors. It marked the successful culmination of a decade-long search for a material to replace aluminum. ... See more

ASML - Twinscan, Step & ...

30 Jun 1995

Just as the first lights of a new millennium were dawning in 1999, ASML announced its newest lithography product, The TwinScan Scanning Stepper. ... See more

Canon - Various models ...

Canon - Various models of Mask Aligners :1980-84 - The only company to offer all 3 types of litho tools. ... See more

Gasonics - HiPOX System

30 Jun 1975

Possibly the only successful high pressure system. ... See more

Technology, Circa 1981 – It's often the overlooked news that turn out to be critical turning points. The pellicle was one such event. Being able to inspect them was even more critical and a large barrier to o ... See more

SEMATECH - An Oral Hist ...

16 Jun 1992

An interview with Dave Anderson ... See more

Building Applied Materi ...

01 Dec 2005

Dan Maydan talks about how Applied Materials built it into a multi-billion dollar, multi-product company ... See more

Bringing Focus to AMAT

07 Mar 2006

Jim Morgan talks about the early days of Applied Materials; how he brought focus by paring down the company's business to the core epitaxy product line; his concept of success; and the three phases of competiti ... See more

ACS200 Lithography Clus ...

The SUSS ACS200 Microlithography Cluster offers superior process performance and unsurpassed productivity for challenging coating applications including coatings of unusually thick and thin photoresist ... See more

Eaton - LSI Series Wafe ...

The Eaton LSI Series has features and performance to solve today's toughest wafer processing problems, and the reliability and flexibility to continue meeting production needs far into the future ... See more