Summary : The DWL 2.0 has been designed with a modular concept in order to ensure maximum up-time and to facilitate performance and application upgrades even in the field.
Just as the first lights of a new millennium were dawning in 1999, ASML announce ...
The semiconductor industry was plunging rapidly into alloy deposition to overcom ...
Suspended vertical laminar flow stations from Micro Air fulfill a variety of nee ...
A 6th gen maskless litho tool from the early 80's.
Cammax Precima - PRS14E Photoresist Spinner :1990s
Applied Materials - Silox Model AMS 2600 & 2660 :1960s - An early tool for low t ...
Ultratech - Positive Resist Develop/Rinse Station Model 504 - For automatic batc ...
The model P 3201 is a low cost, highly efficient dip coating system customarily ...
Applied Materials - PECVD_application-bulletin :1970s
SEMI's Great Moments in Semiconductor History: Invention of the IC
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