Cambridge Instruments - EBML 300

Organization Name :Cambridge Instruments

Summary : Cambridge Instruments - EBML 300 :1985-89 - Maskless Lithography from twenty years ago.

Micronix - MX-15 X-Ray ...

30 Jun 1985

The first commercial American X-ray lithography system. ... See more

Lasarray - DWL 2.0, Las ...

The DWL 2.0 has been designed with a modular concept in order to ensure maximum up-time and to facilitate performance and application upgrades even in the field. ... See more

Applied Materials - AMV ...

30 Jun 1965

Applied materials vertical rotary reactors are widely used by chemical vapor deposition (CPD)... ... See more

1947-The Transistor is ...

16 Dec 1947

SEMI's Great Moments in Semiconductor History: In 1947, Walter Brattain and John Bardeen, working under William Shockley at AT&T Bell Laboratories… ... See more

Ultratech - Positive Re ...

Ultratech - Positive Resist Develop/Rinse Station Model 504 - For automatic batch developing and rinsing positive resist on wafers and photomasks ... See more

Cammax Precima - PRS14E ...

Cammax Precima - PRS14E Photoresist Spinner :1990s ... See more

The model P 3201 is a low cost, highly efficient dip coating system customarily used in applying precision coatings onto high density, assembled printed circuits, irregular shaped substrates, etc. ... See more

Chiang Yang on What’s ...

18 Oct 2006

Intel's Chiang Yang talks about what's new in photomask technology and how Intel Mask Operation (IMO) gives it competitive advantage in this 2006 Interview He describes the latest in Reticle Enhancement Technol ... See more

ASM/Lawton - Encapsulat ...

ASM/Lawton - Encapsulation Press :1970s - Helped make all those plastic DIP packages possible. ... See more

Why the Giant Computer ...

15 Jun 1985

The technology story of the 60s was about the rise of computer giants, with IBM at the vanguard. This went on through the 70s but shifted in the 80s with the advent of the PC. But it wasn’t the advent of the PC ... See more