Anelva - MBE 831 Molecular Beam Epitaxy System

ASML - PAS 2500/10 Step ...

15 Jun 1986

ASML - PAS 2500/10 Stepper :1985-89 ... See more

Jim Bowen talks about how he took Fairchild Test Systems Group from a money loser to the world's largest semiconductor equipment company during the seventies and how mismanagement led to its destruction after h ... See more

KULICKE & SOFFA - 50th ...

KULICKE & SOFFA - 50th Anniversary ... See more

Advantest - ATE Cost-Ef ...

Advantest - Improvements in Cost-Efficiency via parallel memory IC test highlights from this 1986 Annual Report excerpt ... See more

TSMC Founded - The Firs ...

21 Feb 1987

Semiconductor History being made in the 1980’s The founding of TSMC on February 21, 1987 marks an earthquake that would move the tectonic plates that formed the global structure of semiconductor industry. ... See more

Yan Borodovsky with a d ...

19 Sep 2007

Yan Borodovsky demonstrates what was new in DFM and Computational Lithography at Intel in this historic 2007 interview. In this video, Yan Borodovsky, follows up on the first interview with a demonstration that ... See more

LASA Industries - Proto ...

30 Jun 1985

Here is the first true lights-out-fab. Since the beginning of the industry the dream was to have a single system manufacturing plant. ... See more

CONVAC - Modul 6000 ser ...

CONVAC Module 6000 Series photo-lithographic process equipment meets the most stringent requirements of the submicron technology 1 Mega, 4 Mega, 16 Mega, 64 Mega ... See more

Headway Research - R & ...

R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is for both the 200 mm and 300 mm wafers. ... See more

Chiang Yang on What’s ...

18 Oct 2006

Intel's Chiang Yang talks about what's new in photomask technology and how Intel Mask Operation (IMO) gives it competitive advantage in this 2006 Interview He describes the latest in Reticle Enhancement Technol ... See more