Anelva - MBE 831 Molecular Beam Epitaxy System

Organization Name :Anelva

Summary : Anelva - MBE 831 Molecular Beam Epitaxy System :1985-89

TEL - Clean Track Mark ...

01 Jan 1992

TEL's Clean Track Photoresist Processing System ... See more

IBM’s development of ...

22 Sep 1997

IBM was first with copper interconnect for semiconductors. It marked the successful culmination of a decade-long search for a material to replace aluminum. ... See more

Andy Grove talks at IMEC 2004 - the Intel Manufacturing Excellence Conference - about the history of manufacturing and how early practices entered into the Intel legacy flow. Topics include issues deploying new ... See more

The Early Days of Appli ...

29 Nov 2005

Dan Maydan talks about the early days of turning Applied Materials into a technology company ... See more

Canon - FPA-3000 EX4 Al ...

Canon - FPA-3000 EX4 Aligner :1990s ... See more

Varian - VLS 1000 Elect ...

30 Jun 1985

Remember when Varian was in the lithography business? You dont? Well, this was one of the top e-beam direct exposure systems in the early eighties. ... See more

Hitachi - RA-101HL & RA ...

Rare captively made stepper with a Minolta Lens. ... See more

Mix & Match Photoresist ...

30 Jun 1985

In the early eighties virtually every company was seeking entry into the equipment business, or expanding into it via acquisitions. It was the same with Veeco, the Vacuum Equipment Company. ... See more

Toshiba - Space Linear ...

Toshibas advanced control technique created this highly innovative system ... See more

Jerry Hutcheson and his ...

29 Nov 2004

Jerry Hutcheson was honored for pioneering and developing relational databases on the equipment industry that could be consistently maintained and provide a valid history for better decision making. ... See more