Anelva - MBE 831 Molecular Beam Epitaxy System

22 Sep 1997

IBM was first with copper interconnect for semiconductors. It marked the success ...

Ever wonder how the nanochips you see in pictures wind up covered in plastic on ...

Terry Higashi navigated TEL through the toughest times the Equipment Industry ha ...

30 Jun 1985

The Drytek DRIE 100 plasma etcher was the template for all cluster tools that wo ...

30 Jun 1985

This system, from about 1988, represents one of the most successful tungsten dep ...

30 Jun 1975

Not the first such system, but near the first.

CONVAC Photo mask processing equipment

30 Jun 1985

When I first visited this company in the early seventies, it was known as Dainip ...

Applied Materials - Silox Model AMS 2600 & 2660 :1960s - An early tool for low t ...

27 Mar 1998

Most assume it has been paint by the numbers for Intel, since IBM first selected ...