Irie Seisakusho - Spin Drier

30 Jun 1985

This photo shows a descendant of the first Concept One, almost a decade after it ...

15 Jun 1990

A conversation with Robert N. Noyce and Karel Urbanek

30 Jun 1985

Not many commercial machines get more exotic than this. It even looks like somet ...

Introducing Micrascan III+ for Critical Level Lithography

The AutoEtch 590 reduces ion bombardment and attendant device damage by placing ...

It only took 196M Bytes of disk storage for masks in 1983, but hasn’t changed ...

Rare captively made stepper with a Minolta Lens.

Anelva - MBE 831 Molecular Beam Epitaxy System :1985-89

Applied Materials - Autolign CA 3400 Mask Aligner :1980-84 - The remnants of a f ...

Applied Materials - AMS 1000 Silox Reactor :1970s