Irie Seisakusho - Spin Drier

30 Jun 1975

It broke the 1 micron CD barrier.

30 Jun 1985

The tool that sparked the yield management revolution.

The NSR-1505G2A is equipped with a new higher-resolution reduction projection le ...

31 Dec 1969

ESEC is a leading supplier of system solutions and technologies for its business ...

Anelva - MBE 831 Molecular Beam Epitaxy System :1985-89

30 Jun 1965

Applied materials vertical rotary reactors are widely used by chemical vapor dep ...

30 Jun 1985

A 6th gen maskless litho tool from the early 80's.

30 Jun 1975

Here is a workhorse of the early industry, the Teledyne TAC model XY540 wafer pr ...

Long regarded as technology leader in etch, Lam took additional aggressive steps ...

Model 6300C, 6301C(SEE ALSO MODEL 6300 & 6302 DATA SHEET) SUPER SCRUBBER WAFER C ...