Irie Seisakusho - Spin Drier

KLA 200 Series Reticle ...

15 Jun 1984

KLA's Reticle Inspection System was the first automatic inspection system to ensure that killer defects as small as 0.7 microns on both reticles and photomasks would be detected. ... See more

ASML - PAS 2500 Series ...

30 Jun 1985

The system that built the company. ... See more

The Rise of ASML

26 Jul 2006

Martin van den Brink, employee number 1 at ASML, describes what it's been like to take on Japan's giants and win. ... See more

Technics - PE II-A Plan ...

The new approach to etching and deposition: The PlanarEtch ||A Plasma systems from technics ... See more

SRC 25th Anniversary

01 Jun 2007

The history and accomplishments of the Semiconductor Research Corporation ... See more

Dave Markle: Ultratech/ ...

Dave Markle, Senior Vice President & Chief Technical Officer at Ultratech, describes what math and science have done for him and what inspired him to be an engineer. ... See more

CONVAC - Modul 6000 ser ...

CONVAC Module 6000 Series photo-lithographic process equipment meets the most stringent requirements of the submicron technology 1 Mega, 4 Mega, 16 Mega, 64 Mega ... See more

The second part of this three-part interview covers Applied Materials in the 1980s and its transformation into a global company. Jim Morgan talks about Japan, the Rule of Three, SEMI, and his vision of a globa ... See more

Varian - Vacuum/Coater

varian 3135 Vacuum/Coater System ... See more

MTI - Omnichuck

OmniChuck Advanced Wafer Processing System ... See more