Technics - PE II-A Planar Etcher

15 Jun 1986

ASML - PAS 2500/10 Stepper :1985-89

01 Jan 1992

TEL's Clean Track Photoresist Processing System

30 Jun 1975

It broke the 1 micron CD barrier.

Applied Materials - P5000, Etcher :1985-89 - Followed the 8300, but was eclipsed ...

13 Aug 2008

Mihir on the History of Automation in the Semiconductor Industry

30 Jun 1965

Applied materials vertical rotary reactors are widely used by chemical vapor dep ...

30 Jun 1985

When I first visited this company in the early seventies, it was known as Dainip ...

15 Jan 2010

IBM’s R&D partnering model is one of the great business process innovations of t ...

Deep UV 40KX ULTRACURE Photoresist Stabilization Sytsem

Ultratech - Positive Photoresist Develop Station Model 503