Summary : The new approach to etching and deposition: The PlanarEtch ||A Plasma systems from technics
Though not the first step & scan system—that honor goes to Perkin Elmer—this ...
Art Zafiropoulo was honored for championing technology through innovative market ...
Well known in the U.S. as a Marubeni import, Shinkawa’s wire bonders had also ...
R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is ...
The Eaton LSI Series has features and performance to solve today's toughest wafe ...
It only took 196M Bytes of disk storage for masks in 1983, but hasn’t changed ...
Applied Materials - Implant 9000, Ion Implanter :1985-1989
The TP 6000 model has been designed and developed according to a very modular co ...
Mihir Parikh tells us about the big Automation Do's and Don'ts
Long regarded as technology leader in etch, Lam took additional aggressive steps ...
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