Summary : The SUSS ACS200 Microlithography Cluster offers superior process performance and unsurpassed productivity for challenging coating applications including coatings of unusually thick and thin photoresist
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CONVAC Photo mask processing equipment
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In the early eighties virtually every company was seeking entry into the equipme ...
Applied Materials - SPCVD-4000 :1960s - An LPCVD tool from a time when Applied c ...
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In 1998, IBM and Novellus caught the world off-guard when they announced they we ...
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