Wafer Cleaning was the continual Achilles heel of the semiconductor industry. Removing the debris and detritus from the wafer surface prior to the next deposition was particularly vexing; even dried water spots could destroy a good run. Brush cleaning was the preferred method but it left scratch damage to the surface.
This unit was one of the earliest successful brushless scrubbers and paved the way for success of many others. And like many others during the early days of yearnings for auto fabs, it was given the prefix identifier AF, to go along with the similarly named remainder of the line.Click Here for Product Brochure & Specifications
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- Industry code: 1474.325
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