Nippon Seiko - TZ-310 Exposure System

Organization Name :Nippon Seiko

Summary : TZ-310 Multi-Function System for Semiconductor Production

Lessons Learned at Appl ...

12 Dec 2005

Dan Maydan gives his tips about how to be successful running a technology company in the lessons learned section. ... See more

Technics - PE II-A Plan ...

The new approach to etching and deposition: The PlanarEtch ||A Plasma systems from technics ... See more

Electromask - 700SLR St ...

30 Jun 1975

Arguably the best stepper of its day, based on resale values. ... See more

In the early eighties virtually every company was seeking entry into the equipment business, or expanding into it via acquisitions. It was the same with Veeco, the Vacuum Equipment Company. ... See more

Kumud Srinivasan on Fab ...

04 Jun 2004

Kumud Srinivasan, Director of Fab Automation, Intel discusses the status of Semiconductor Fab Automation at Intel in this 2004 interview. Find out where Intel was at the time and what it saw ahead in fab autom ... See more

Applied Materials - Sil ...

Applied Materials - Silox Model AMS 2600 & 2660 :1960s - An early tool for low temperature oxides. Used for reflow, these tools improved metal yields substantially. ... See more

Yan Borodovsky on DFM a ...

13 Sep 2007

Yan Borodovsky discusses DFM and Computational Lithography at Intel in historic 2007 interview. He covers what it’s about and how it’s a Chip Making Revolution ... See more

Sumitomo Heavy Industri ...

A precursor to the excimer laser. But it was solely for X-ray wavelengths. It was an essential part of the infrastructure developed for a Next Generation Lithography technology that never materialized for other ... See more

MTI - Model 6300 Scrubb ...

Model 6300C, 6301C(SEE ALSO MODEL 6300 & 6302 DATA SHEET) SUPER SCRUBBER WAFER CLEANERS... to eliminate or minimize particular contamination ... See more

Irie Seisakusho - Spin ...

Irie Seisakusho - Spin Drier ... See more