Nippon Seiko - TZ-310 Exposure System

Organization Name :Nippon Seiko

Summary : TZ-310 Multi-Function System for Semiconductor Production

IBM’s development of ...

22 Sep 1997

IBM was first with copper interconnect for semiconductors. It marked the successful culmination of a decade-long search for a material to replace aluminum. ... See more

MRC - Series 900 In-Lin ...

30 Jun 1975

The semiconductor industry was plunging rapidly into alloy deposition to overcome many separate problems. ... See more

Advantest - ATE Cost-Ef ...

Advantest - Improvements in Cost-Efficiency via parallel memory IC test highlights from this 1986 Annual Report excerpt ... See more

Applied Materials - Pre ...

Applied Materials - Precision Etch 8300 :1985-89 - The extension of the blockbuster that remapped the etch market. ... See more

Jim Bowen talks about how he took Fairchild Test Systems Group from a money loser to the world's largest semiconductor equipment company during the seventies and how mismanagement led to its destruction after h ... See more

FSI - 8251 Clean Machin ...

The 8251 single cassette, horizontal, on-center clean machine features the high quality and ruggedness of construction you expect from FSI. ... See more

Verteq - Ultraclean Hig ...

Verteq - Ultraclean High Purity Megasonic System offers the same superior cleaning performance and ease of use as standard megasonic cleaning systems, plus an exclusive polished quartz transduser panel ... See more

Applied Materials - Sil ...

Applied Materials - Silox Model AMS 2600 & 2660 :1960s - An early tool for low temperature oxides. Used for reflow, these tools improved metal yields substantially. ... See more

Ultratech - Positive Ph ...

Ultratech - Positive Photoresist Develop Station Model 503 ... See more

Uniplane System 4000 Hi ...

The versatile programmability of Kasper's System 4000 High Pressure Scrubber allows semiconductor wafers to be decontaminated by brush scrubbing. ... See more