Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.
Long regarded as technology leader in etch, Lam took additional aggressive steps ...
Lam Research Corporation was founded in 1980 when advance in micro miniaturizati ...
ASML - Philips Beamwriter :1985-89
High-energy ion implanters, typically in the range of 1 to 3 MEV, were originall ...
Cobilt - Autofab, Inline Resist Processing System
The DWL 2.0 has been designed with a modular concept in order to ensure maximum ...
The first commercial American X-ray lithography system.
This little bench-top tester was a real Mighty Mouse© as the sixties ended and ...
Accelerators Inc was one of the three or four early implementers of ion implante ...
An early disk coating system
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