Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.
Lam Research Corporation was founded in 1980 when advance in micro miniaturizati ...
Long regarded as technology leader in etch, Lam took additional aggressive steps ...
Andy Grove talks at IMEC 2004 - the Intel Manufacturing Excellence Conference - ...
SUSS spin coaters combine state of the art technology with an innovative concept ...
The APTCON 3000 is a modular spin processing system designed by APT and CONVAC, ...
The 8050 yields consistent, repeatable wafer-to-wafer results, providing maximum ...
Sean Maloney, who heads up Intel’s Mobility Group, talks about its new duo, 65 ...
Semiconductor Systems' new System 200 is state-of-the-art equipment for submicro ...
Kumud Srinivasan, Director of Fab Automation, Intel discusses the status of Semi ...
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