Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.
Martin Anstice: Pulled off hyper-growth in a high-growth year
Lam Research Corporation was founded in 1980 when advance in micro miniaturizati ...
Long regarded as technology leader in etch, Lam took additional aggressive steps ...
The semiconductor industry was plunging rapidly into alloy deposition to overcom ...
Arguably the best stepper of its day, based on resale values.
Canon - FPA-3000 EX4 Aligner :1990s
OmniChuck Advanced Wafer Processing System
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
Cambridge Instruments - EBML 300 :1985-89 - Maskless Lithography from twenty yea ...
The model P 3201 is a low cost, highly efficient dip coating system customarily ...
Copyright © 2019 VLSI Research Inc. All rights reserved.