Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.
Lam Research Corporation was founded in 1980 when advance in micro miniaturizati ...
Long regarded as technology leader in etch, Lam took additional aggressive steps ...
Toshio Maruyama reflects on the history and future of Advantest and its role in ...
Not many commercial machines get more exotic than this. It even looks like somet ...
Introducing Micrascan III+ for Critical Level Lithography
Anelva - MBE 831 Molecular Beam Epitaxy System :1985-89
Applied Materials - The Omega-Centura System :1990s
Applied Materials - AMS 2000 Silox Reactor :1970s
Silicon Valley Group - 90 Series Resist Processing - High Productivity photo pro ...
Applied Materials - Silox Model AMS 1200 :1960s - Wafers were laid out by hand i ...
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