Auto Etch 590 Oxide Etcher

Organization Name :Lam Research

Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.

Excerpt from 1999 Annua ...

Long regarded as technology leader in etch, Lam took additional aggressive steps in fiscal 1999 to position the Company for success and to gain market share ... See more

Excerpt from 1984 Annua ...

Lam Research Corporation was founded in 1980 when advance in micro miniaturization technology produce dramatic changes in the way that integrated circuits were made. ... See more

Proximity aligners were a bridge tool between the original contact aligners and projection aligners. Yield from contact aligners was extremely low, mainly because the mask was just a stencil laying over the pho ... See more

In the News: Technology ...

01 Jun 1981

This technical paper laid out the future of yield management, covering all the issues the industry faced with defects and gave a vision for resolving them. It became the foundation on which KLA was built. Publi ... See more

Craig Barrett: How Inte ...

04 May 2006

Craig describes the origins of manufacturing lore such as Copy Exactly, Intel U, and refsnart in this interview ... See more

Hitachi - HL-700, E-bea ...

Rare captively made e-beam system that would break out into the commercial world. ... See more

Eaton - LSI Series Wafe ...

The Eaton LSI Series has features and performance to solve today's toughest wafer processing problems, and the reliability and flexibility to continue meeting production needs far into the future ... See more