Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.
Martin Anstice: Pulled off hyper-growth in a high-growth year
Lam Research Corporation was founded in 1980 when advance in micro miniaturizati ...
Long regarded as technology leader in etch, Lam took additional aggressive steps ...
Applied Materials - Precision 5000 CVD, The blockbuster that made cluster tool a ...
Canon - Various models of Mask Aligners :1980-84 - The only company to offer all ...
X-Ray Exposure technology has long been said to be the technology of tomorrow. T ...
A 6th gen maskless litho tool from the early 80's.
Here is the first true lights-out-fab. Since the beginning of the industry the d ...
Tylan - Baking System
Bill Holt on Business Incentives for Semiconductor R&D
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