Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.
Lam Research Corporation was founded in 1980 when advance in micro miniaturizati ...
Long regarded as technology leader in etch, Lam took additional aggressive steps ...
How Andy changed our industry in fundamental ways.
Though not as elegantly encased as the Perkin-Elmer 100, here was Japan’s answ ...
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The SET's Answer To Your Photoresist Coating Problems
Cammax Precima - PRS14E Photoresist Spinner :1990s
Electroglas - Model 3001 Wafer Prober System :1990s
Applied Materials - PECVD_application-bulletin :1970s
As semiconductor geometry device continues to shring, positive resist systems ar ...
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