Auto Etch 590 Oxide Etcher

Organization Name :Lam Research

Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.

Excerpt from 1984 Annua ...

Lam Research Corporation was founded in 1980 when advance in micro miniaturization technology produce dramatic changes in the way that integrated circuits were made. ... See more

Excerpt from 1999 Annua ...

Long regarded as technology leader in etch, Lam took additional aggressive steps in fiscal 1999 to position the Company for success and to gain market share ... See more

ASML - Twinscan, Step & ...

30 Jun 1995

Just as the first lights of a new millennium were dawning in 1999, ASML announced its newest lithography product, The TwinScan Scanning Stepper. ... See more

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15 Jul 1971

The industry was in its childhood? When two or three SEMICON trade shows covered the entire world? ... See more

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Suspended vertical laminar flow stations from Micro Air fulfill a variety of needs where clean air is required, and where your facility can accommodate suspending to achieve an openness ... See more

Building a Global Posit ...

16 Mar 2006

The second part of this three-part interview covers Applied Materials in the 1980s and its transformation into a global company. Jim Morgan talks about Japan, the Rule of Three, SEMI, and his vision of a globa ... See more