Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.
Lam Research Corporation was founded in 1980 when advance in micro miniaturizati ...
Long regarded as technology leader in etch, Lam took additional aggressive steps ...
Applied Materials - P5000, Etcher :1985-89 - Followed the 8300, but was eclipsed ...
Fairchild lead the industry from mesa-transistors to diffusion using Jean Hoerni ...
Gemini-The Platform of Excellence for Photoresist Processing
The SUSS ACS200 Microlithography Cluster offers superior process performance and ...
Not the first such system, but near the first.
The LS22 Series of large substrate spinners is designed for versatility, ease of ...
What the cutting edge of etching looked like in 1980
Paul Otellini was the first to pass from the semiconductor industry’s sec ...
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