Auto Etch 590 Oxide Etcher

Organization Name :Lam Research

Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.

Excerpt from 1999 Annua ...

Long regarded as technology leader in etch, Lam took additional aggressive steps in fiscal 1999 to position the Company for success and to gain market share ... See more

Excerpt from 1984 Annua ...

Lam Research Corporation was founded in 1980 when advance in micro miniaturization technology produce dramatic changes in the way that integrated circuits were made. ... See more

ASML - Twinscan, Step & ...

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Just as the first lights of a new millennium were dawning in 1999, ASML announced its newest lithography product, The TwinScan Scanning Stepper. ... See more

Takeda Riken, the antecedent to Advantest, was hardly known outside Japan in 1980 and by 1985 it was driving the VLSI or Very Large Scale Integration ATE market as the largest company at the time fell back. Gro ... See more

ACS200 Lithography Clus ...

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The DWL 2.0 has been designed with a modular concept in order to ensure maximum up-time and to facilitate performance and application upgrades even in the field. ... See more

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Applied Materials - Silox Model AMS 2600 & 2660 :1960s - An early tool for low temperature oxides. Used for reflow, these tools improved metal yields substantially. ... See more