Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.
Long regarded as technology leader in etch, Lam took additional aggressive steps ...
Lam Research Corporation was founded in 1980 when advance in micro miniaturizati ...
This video is a manufacturing IT case study that shows Intel's first true 300mm ...
The Drytek DRIE 100 plasma etcher was the template for all cluster tools that wo ...
Introducing Micrascan III+ for Critical Level Lithography
VIBRATRAC, GCA's new fully automatic production end station, is the result of a ...
Cambridge Instruments - EBML 300 :1985-89 - Maskless Lithography from twenty yea ...
varian 3135 Vacuum/Coater System
BTU - Bruce Diffusion Furnaces :1980-84 - A Real Workhorse from the Early Days.
During many of the early years, in a little shop on Arques Avenue in Sunnyvale, ...
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