Edwards - Thin Film Deposition System

ASML - PAS 2500/10 Step ...

15 Jun 1986

ASML - PAS 2500/10 Stepper :1985-89 ... See more

Nikon - NSR-2205i11D St ...

The state-of-the-art workhorse for 0.35 micron. ... See more

Advantest turned 50 on July 1, 2004. It was a milestone for one of Japan's greatest tech companies. This documents that history from the company's first product, the Micro Ammeter, through it's release of its g ... See more

Headway Research - R & ...

R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is for both the 200 mm and 300 mm wafers. ... See more

The Bob Graham Award

29 Nov 2004

What About Bob - Robert Graham's video biography of his career with comments about him, sometimes roasting him, from industry luminaries such as Gordon Moore, Marshall Cox, Mel Phelps, and G. Dan Hutcheson. ... See more

LFE Corporation - 501 C ...

30 Jun 1975

Not the first such system, but near the first. ... See more

Mix & Match Photoresist ...

30 Jun 1985

In the early eighties virtually every company was seeking entry into the equipment business, or expanding into it via acquisitions. It was the same with Veeco, the Vacuum Equipment Company. ... See more

Fusion - MICROLITE Seri ...

Microlite 150 Series Photostabilizer Systems provide a clean one-step process for hardening of photoresists at high production throughput. ... See more

Tempress - DDC Diffusio ...

Tempress - A unit of general signal - DDC Diffusion furnace ... See more

Uniplane System 4000 Hi ...

The versatile programmability of Kasper's System 4000 High Pressure Scrubber allows semiconductor wafers to be decontaminated by brush scrubbing. ... See more