Edwards - Thin Film Deposition System

GCA - Mann 4800 Direct ...

30 Jun 1975

It broke the 1 micron CD barrier. ... See more

The Chip Insider's Cook’s Tour: A deep immersion course in what IBM was doing in 2008 at both Albany Nanotech and at IBM’s Fishkill facility is reviewed by VLSIresearch's Chip Insider in this 2008 article. ... See more

Ultratech Stepper - Mod ...

Ultratech Stepper - Model 900 H/G Line stepper - Versatile, Adaptable, Flexible ... See more

Intel's 35th Anniversar ...

18 Jul 2003

Starting a silicon revolution, also known as the “Fairchild Brain Drain,” Bob Noyce and Gordon Moore leave Fairchild Semiconductor ... See more

FSI - 8251 Clean Machin ...

The 8251 single cassette, horizontal, on-center clean machine features the high quality and ruggedness of construction you expect from FSI. ... See more

KLA Conquers Phase Shif ...

20 May 1991

Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask. ... See more

Nippon Seiko - TZ-310 E ...

TZ-310 Multi-Function System for Semiconductor Production ... See more

KLA Conquers the Pellic ...

16 Nov 1981

Technology, Circa 1981 – It's often the overlooked news that turn out to be critical turning points. The pellicle was one such event. Being able to inspect them was even more critical and a large barrier to o ... See more

Solitec - 1111-TD Const ...

As semiconductor geometry device continues to shring, positive resist systems are becoming increasingly important in meeting the need of high resolution. ... See more

Integrated Technologies ...

The model P 3201 is a low cost, highly efficient dip coating system customarily used in applying precision coatings onto high density, assembled printed circuits, irregular shaped substrates, etc. ... See more