Edwards - Thin Film Deposition System

ASML - PAS 5500/400, St ...

30 Jun 1995

Though not the first step & scan system—that honor goes to Perkin Elmer—this unit was the second step & scan system released by ASML. ... See more

Novellus - Concept One ...

30 Jun 1985

This photo shows a descendant of the first Concept One, almost a decade after its original development as a conventional CVD system. ... See more

Perkin Elmer - Micralig ...

30 Jun 1975

The Intel secret weapon that turned the industry upside-down and revolutionized lithography. ... See more

Intel's Manufacturing A ...

03 Jul 1997

Intel's Overlooked Advantage: A Case Study in Why Manufacturing Matters ... See more

In the early eighties virtually every company was seeking entry into the equipment business, or expanding into it via acquisitions. It was the same with Veeco, the Vacuum Equipment Company. ... See more

SET - TP6000 Spinner

The TP 6000 model has been designed and developed according to a very modular concept which make it a multiple-purpose tool adapted to your technical requirements, your production needs and your budget. ... See more

Karl Suss - LSX10 X-Ray ...

30 Jun 1985

The Karl Suss company was one of the first companies to explore commercial X-Ray exposure systems. ... See more

Semiconductor System - ...

System 150 is the intelligent solution for successful submicron process control. Semiconductor Systems produces one of the highest throughput performers in the industry. ... See more

Fusion - Dual Chamber P ...

Dual Chamber Photostabilizer ... See more

Solitec - 1111-TD Const ...

As semiconductor geometry device continues to shring, positive resist systems are becoming increasingly important in meeting the need of high resolution. ... See more