Summary : Intel's Chiang Yang talks about what's new in photomask technology and how Intel Mask Operation (IMO) gives it competitive advantage in this 2006 Interview He describes the latest in Reticle Enhancement Technology, including their use of dual exposure, APSM technology (Alternating Phase Shift Mask). Learn how they are able to make 45nm chips with 193nm exposure tools. Chiang also tells of the 4 C's: Capability, Cycle Time, Customer integration, and Cost and how they define the competitive advant ... See More
Annexure :
Intel's Chiang Yang talks about what's new in photomask technology and how Intel Mask Operation (IMO) gives it competitive advantage.
