Technics - PE II-A Planar Etcher

Organization Name :Technics

Summary : The new approach to etching and deposition: The PlanarEtch ||A Plasma systems from technics

KLA 200 Series Reticle ...

15 Jun 1984

KLA's Reticle Inspection System was the first automatic inspection system to ensure that killer defects as small as 0.7 microns on both reticles and photomasks would be detected. ... See more

Bill Tobey on his Bob G ...

06 Dec 2006

Bill Tobey on his 2006 Bob Graham Award and Lessons Learned ... See more

Headway Research - R & ...

R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is for both the 200 mm and 300 mm wafers. ... See more

Cobilt - Model AF110 Br ...

Cobilt - Model AF110 Brushless Scrubber :1980-84 ... See more

CONVAC - APTCON 3000 Mo ...

The APTCON 3000 is a modular spin processing system designed by APT and CONVAC, the worlds leading manufacturers of processing equipment of microlithography for than two decades. ... See more

Silicon Valley Group - ...

Silicon Valley Group - 90 Series Resist Processing - High Productivity photo processing ... See more

Electroglas - Model 300 ...

Electroglas - Model 3001 Wafer Prober System :1990s ... See more

Suspended vertical laminar flow stations from Micro Air fulfill a variety of needs where clean air is required, and where your facility can accommodate suspending to achieve an openness ... See more

Ultratech - Model 504 R ...

Ultratech - Model 504 Resist Develop/Rinse System - Positive photo resist Develop / Rinse Station Model 504 ... See more

APT - 9155 E-Beam Resis ...

APT - 9155 E-Beam Resist Processor :1985-89 ... See more