Summary : The LS22 Series of large substrate spinners is designed for versatility, ease of use and safety in a variety of manual and automated research and development process.
R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is ...
The new approach to etching and deposition: The PlanarEtch ||A Plasma systems fr ...
The Drytek DRIE 100 plasma etcher was the template for all cluster tools that wo ...
The Dawn of the CD SEM came with Hitachi’s (now Hitachi High-Technologies) add ...
The child of the legendary Cambridge maskless systems.
Tazmo - Spin Coater TR6000 and TR5000 Series
TZ-310 Multi-Function System for Semiconductor Production
The elegant simplicity of this small machine belies the fact that an earlier anc ...
Veeco - Flexible Automated Wafer Fab System - Increased productivity, Improve yi ...
Model 6300C, 6301C(SEE ALSO MODEL 6300 & 6302 DATA SHEET) SUPER SCRUBBER WAFER C ...
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