Summary : The LS22 Series of large substrate spinners is designed for versatility, ease of use and safety in a variety of manual and automated research and development process.
R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is ...
Canon - Various models of Mask Aligners :1980-84 - The only company to offer all ...
The history of semiconductor research at Intel is discussed in this 2004 convers ...
The new approach to etching and deposition: The PlanarEtch ||A Plasma systems fr ...
The history and accomplishments of the Semiconductor Research Corporation
The AutoEtch 590 reduces ion bombardment and attendant device damage by placing ...
Applied Materials - Implant 9000, Ion Implanter :1985-1989
Yan Borodovsky discusses DFM and Computational Lithography at Intel in historic ...
During many of the early years, in a little shop on Arques Avenue in Sunnyvale, ...
Sean Maloney, who heads up Intel’s Mobility Group, talks about its new duo, 65 ...
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