Summary : The LS22 Series of large substrate spinners is designed for versatility, ease of use and safety in a variety of manual and automated research and development process.
R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is ...
This photo shows a descendant of the first Concept One, almost a decade after it ...
The state-of-the-art workhorse for 0.35 micron.
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
The SUSS ACS200 Microlithography Cluster offers superior process performance and ...
What About Bob - Robert Graham's video biography of his career with comments abo ...
The SET's Answer To Your Photoresist Coating Problems
The child of the legendary Cambridge maskless systems.
Cobilt - Model AF110 Brushless Scrubber :1980-84
SEMI's Great Moments in Semiconductor History: Invention of the IC
Access to and use of this Website is subject to TechInsights' Terms of Use (including Copyright Policy & Claims) and Privacy Policy. By accessing or using this Website you agree to TechInsights' Terms of Use (including Copyright Policy & Claims) and Privacy Policy.
Copyright © 2025 TechInsights Inc. All rights reserved.