Summary : The LS22 Series of large substrate spinners is designed for versatility, ease of use and safety in a variety of manual and automated research and development process.
R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is ...
Applied Materials - Precision Etch 8300 :1985-89 - The extension of the blockbus ...
Rare captively made stepper with a Minolta Lens.
CONVAC compact equipment is derived from fully developed components of Module 20 ...
Versatile Systems For Thin Film Deposition
Applied Materials - CA-800 Mask Aligner and Exposure System: :1980-84
System 150 is the intelligent solution for successful submicron process control. ...
During many of the early years, in a little shop on Arques Avenue in Sunnyvale, ...
Silicon Valley Group - Model 8800 ATS Track (Arm Transport System)
Deep UV 40KX ULTRACURE Photoresist Stabilization Sytsem
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