Summary : The LS22 Series of large substrate spinners is designed for versatility, ease of use and safety in a variety of manual and automated research and development process.
R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is ...
The tool that sparked the yield management revolution.
A pinnacle technically, it was also the end of the road for projection aligners.
Rare captively made e-beam system that would break out into the commercial world ...
X-Ray Exposure technology has long been said to be the technology of tomorrow. T ...
Applied Materials - CA-800 Mask Aligner and Exposure System: :1980-84
Thomas Sonderman discusses Automated Precision Manufacturing and how it allows A ...
An early disk coating system
Ultratech - Positive Resist Develop/Rinse Station Model 504 - For automatic batc ...
Intel's Chiang Yang talks about what's new in photomask technology and how Intel ...
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