Summary : The LS22 Series of large substrate spinners is designed for versatility, ease of use and safety in a variety of manual and automated research and development process.
R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is ...
TEL's Clean Track Photoresist Processing System
The new approach to etching and deposition: The PlanarEtch ||A Plasma systems fr ...
The AutoEtch 590 reduces ion bombardment and attendant device damage by placing ...
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
Important events and trends were in 1997 for the semiconductor industry
Though not as elegantly encased as the Perkin-Elmer 100, here was Japan’s answ ...
Ultratech - Pellicle Equipment and Accessories - To implement the use of pellicl ...
A 6th gen maskless litho tool from the early 80's.
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