Summary : R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is for both the 200 mm and 300 mm wafers.
The LS22 Series of large substrate spinners is designed for versatility, ease of ...
Martin van den Brink, employee number 1 at ASML, describes what it's been like t ...
The history of semiconductor research at Intel is discussed in this 2004 convers ...
Blue M Class A batch ovens are mechanical convection electric chambers that incl ...
Possibly the only successful high pressure system.
From the West Coast’s premier, but now dead, stepper company.
Applied Materials - AMS 2000 Silox Reactor :1970s
MX-17 LSI Test System by Adar Associates, Inc...
The AMI Model 2100 is an excellent representative of Second Optical Inspection s ...
Applied Materials - CA-2020H Mask Aligner :1980-84
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