Summary : R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is for both the 200 mm and 300 mm wafers.
The LS22 Series of large substrate spinners is designed for versatility, ease of ...
Applied Materials - Precision 5000 CVD, The blockbuster that made cluster tool a ...
The NSR-1505G2A is equipped with a new higher-resolution reduction projection le ...
Significant improvement in manufacturing worthiness for the first Step-and-Scan ...
Advantest - T3342 VLSI Test System :1985-89
A pinnacle technically, it was also the end of the road for projection aligners.
Dan Maydan talks about how Applied Materials built it into a multi-billion dolla ...
The SUSS ACS200 Microlithography Cluster offers superior process performance and ...
From the West Coast’s premier, but now dead, stepper company.
APT - 9155 E-Beam Resist Processor :1985-89
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