Headway Research - R & D Spin Coater

Organization Name :Headway Research

Summary : R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is for both the 200 mm and 300 mm wafers.

Headway Research - LS22 ...

The LS22 Series of large substrate spinners is designed for versatility, ease of use and safety in a variety of manual and automated research and development process. ... See more

Fusion - 200 PCU Photos ...

The 200PCU Photostabilizer utilizes the standard dual unicassette wafer handling platform. ... See more

Fairchild lead the industry from mesa-transistors to diffusion using Jean Hoerni's planar process, which would lay the foundation for the Integrated Circuit, Moore's Law, and would be the base process for almos ... See more

Decision Making at Inte ...

21 Jan 2008

Bill Holt on Business Incentives for Semiconductor R&D ... See more

Mix & Match Photoresist ...

30 Jun 1985

In the early eighties virtually every company was seeking entry into the equipment business, or expanding into it via acquisitions. It was the same with Veeco, the Vacuum Equipment Company. ... See more

Veeco - ai Model 2100 I ...

30 Jun 1975

Accelerators Inc was one of the three or four early implementers of ion implanters. The company was acquired by Veeco in the mid seventies. ... See more

Verteq - Ultraclean Hig ...

Verteq - Ultraclean High Purity Megasonic System offers the same superior cleaning performance and ease of use as standard megasonic cleaning systems, plus an exclusive polished quartz transduser panel ... See more

Karl Suss - LSX10 X-Ray ...

30 Jun 1985

The Karl Suss company was one of the first companies to explore commercial X-Ray exposure systems. ... See more

Chiang Yang on What’s ...

18 Oct 2006

Intel's Chiang Yang talks about what's new in photomask technology and how Intel Mask Operation (IMO) gives it competitive advantage in this 2006 Interview He describes the latest in Reticle Enhancement Technol ... See more

Electronic Visions - EV ...

Electronic Visions - EV150 Resist Processing System :1990s ... See more