Summary : R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is for both the 200 mm and 300 mm wafers.
The LS22 Series of large substrate spinners is designed for versatility, ease of ...
This photo shows a descendant of the first Concept One, almost a decade after it ...
Applied Materials - P5000, Etcher :1985-89 - Followed the 8300, but was eclipsed ...
How Andy changed our industry in fundamental ways.
Saturn wafer stepper Advancing Mix-and-Match Lithography
The Drytek DRIE 100 plasma etcher was the template for all cluster tools that wo ...
You might think that some of the early glass deposition systems looked like gran ...
The first commercial American X-ray lithography system.
Applied Materials - CA-800 Mask Aligner and Exposure System: :1980-84
Jerry Hutcheson was honored for pioneering and developing relational databases o ...
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