Tempress - DDC Diffusion furnace

30 Jun 1975

You might think that some of the early glass deposition systems looked like gran ...

22 Sep 1997

IBM was first with copper interconnect for semiconductors. It marked the success ...

30 Jun 1995

Just as the first lights of a new millennium were dawning in 1999, ASML announce ...

Terry Higashi navigated TEL through the toughest times the Equipment Industry ha ...

30 Jun 1965

A little system that was to become one of the most favored probers on the west c ...

Verteq - Ultraclean High Purity Megasonic System offers the same superior cleani ...

OmniChuck Advanced Wafer Processing System

Applied Materials - SPCVD-4000 :1960s - An LPCVD tool from a time when Applied c ...

Applied Materials - Silox Model AMS 2600 & 2660 :1960s - An early tool for low t ...

15 Jun 2003

TEL's history and philosophy of serving semiconductor manufacturers