TEL's Clean Track Photoresist Processing System
The state-of-the-art workhorse for 0.35 micron.
Applied Materials - Implant 9000, Ion Implanter :1985-1989
Watch circuit test system 193A
Cameca - XPWS 301 Proximity Step and Repeat System :1980-84 - Thompson’s x-ray ...
Silicon Valley Group - 90 Series Resist Processing - High Productivity photo pro ...
Steve Nakayama honored for his contribution in helping globalize the semiconduct ...
Model 6300C, 6301C(SEE ALSO MODEL 6300 & 6302 DATA SHEET) SUPER SCRUBBER WAFER C ...
Electronic Visions - EV150 Resist Processing System :1990s
Irie Seisakusho - Spin Drier
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