TRE - 800SLR Wafer Stepper

Organization Name :TRE

Summary : The fully automatic TRE - 800SLR Wafer Stepper

ASML - PAS 2500 Series ...

30 Jun 1985

The system that built the company. ... See more

This technical paper laid out the future of yield management, covering all the issues the industry faced with defects and gave a vision for resolving them. It became the foundation on which KLA was built. Publi ... See more

Canon - PLA 501F/FA Pro ...

30 Jun 1975

Proximity aligners were a bridge tool between the original contact aligners and projection aligners. Yield from contact aligners was extremely low, mainly because the mask was just a stencil laying over the pho ... See more

KLA 200 Series Reticle ...

15 Jun 1984

KLA's Reticle Inspection System was the first automatic inspection system to ensure that killer defects as small as 0.7 microns on both reticles and photomasks would be detected. ... See more

Technics - PE II-A Plan ...

The new approach to etching and deposition: The PlanarEtch ||A Plasma systems from technics ... See more

Decision Making at Inte ...

21 Jan 2008

Bill Holt on Business Incentives for Semiconductor R&D ... See more

American Competitivenes ...

10 May 2006

Craig Barrett, Chairman of Intel, describes why America is losing its edge and what needs to be done about it. ... See more

Screen - The P210 Wet P ...

30 Jun 1985

When I first visited this company in the early seventies, it was known as Dainippon Screen. ... See more

IMS - Ion Beam Exposure ...

30 Jun 1985

The push for sub-micron line features sprouted several experimental attempts, among them X-Ray, e-beam, optical steppers and ion beam machines. ... See more

Yan Borodovsky with a d ...

19 Sep 2007

Yan Borodovsky demonstrates what was new in DFM and Computational Lithography at Intel in this historic 2007 interview. In this video, Yan Borodovsky, follows up on the first interview with a demonstration that ... See more

TRE - 800SLR Wafer Stepper

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