Chuo Riken - Resist Processing Equipment

Applied Materials - End ...

12 Jul 1990

Applied Materials - Endura 5500 PVD: The first bullet-proof multi-chamber, multi-process system. It would become the most successful metallization system in the history of the semiconductor industry. ... See more

Varian - The MBE GEN II ...

30 Jun 1985

Not many commercial machines get more exotic than this. It even looks like something out of StarTrek. ... See more

Gasonics - HiPOX System

30 Jun 1975

Possibly the only successful high pressure system. ... See more

Terry Higashi - HoF

Terry Higashi navigated TEL through the toughest times the Equipment Industry has ever seen, all the while building them into a technology leader ... See more

Varian - VLS 1000 Elect ...

30 Jun 1985

Remember when Varian was in the lithography business? You dont? Well, this was one of the top e-beam direct exposure systems in the early eighties. ... See more

Headway Research - R & ...

R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is for both the 200 mm and 300 mm wafers. ... See more

IBM’s R&D Partnering Mo ...

15 Jan 2010

IBM’s R&D partnering model is one of the great business process innovations of the semiconductor industry. IBM’s model has become the gold standard of competitive R&D partnering. ... See more

2003: Steve Nakayama

29 Nov 2004

Steve Nakayama honored for his contribution in helping globalize the semiconductor equipment industry. He talks about how ITPC got started and the methods he used to convince Japanese semiconductor executives t ... See more

Sumitomo Heavy Industri ...

A precursor to the excimer laser. But it was solely for X-ray wavelengths. It was an essential part of the infrastructure developed for a Next Generation Lithography technology that never materialized for other ... See more

Ultratech - Model 504 R ...

Ultratech - Model 504 Resist Develop/Rinse System - Positive photo resist Develop / Rinse Station Model 504 ... See more