Summary : A precursor to the excimer laser. But it was solely for X-ray wavelengths. It was an essential part of the infrastructure developed for a Next Generation Lithography technology that never materialized for other reasons.
Dan Maydan gives his tips about how to be successful running a technology compan ...
ASML - Philips Beamwriter :1985-89
Well known in the U.S. as a Marubeni import, Shinkawa’s wire bonders had also ...
Semiconductor History being made in the 1980’s The founding of TSMC on Febr ...
It only took 196M Bytes of disk storage for masks in 1983, but hasn’t changed ...
Introducing Micrascan III+ for Critical Level Lithography
Microlite 150 Series Photostabilizer Systems provide a clean one-step process fo ...
Ultratech - Pellicle Equipment and Accessories - To implement the use of pellicl ...
Here is a workhorse of the early industry, the Teledyne TAC model XY540 wafer pr ...
Ultratech - Positive Resist Develop/Rinse Station Model 504 - For automatic batc ...
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