Summary : A precursor to the excimer laser. But it was solely for X-ray wavelengths. It was an essential part of the infrastructure developed for a Next Generation Lithography technology that never materialized for other reasons.
These strategies were what made Intel so successful.
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
Martin van den Brink, employee number 1 at ASML, describes what it's been like t ...
High-energy ion implanters, typically in the range of 1 to 3 MEV, were originall ...
High Throughput Bumped Wafer Characterization System
Watch circuit test system 193A
Applied Materials - CA-800 Mask Aligner and Exposure System: :1980-84
During many of the early years, in a little shop on Arques Avenue in Sunnyvale, ...
Intel's Chiang Yang talks about what's new in photomask technology and how Intel ...
Chuo Riken - Resist Processing Equipment :
Access to and use of this Website is subject to TechInsights' Terms of Use (including Copyright Policy & Claims) and Privacy Policy. By accessing or using this Website you agree to TechInsights' Terms of Use (including Copyright Policy & Claims) and Privacy Policy.
Copyright © 2025 TechInsights Inc. All rights reserved.