Summary : A precursor to the excimer laser. But it was solely for X-ray wavelengths. It was an essential part of the infrastructure developed for a Next Generation Lithography technology that never materialized for other reasons.
Teradyne - J973 VLSI Test System
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KULICKE & SOFFA - 50th Anniversary
R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is ...
Long regarded as technology leader in etch, Lam took additional aggressive steps ...
Thomas Sonderman discusses Automated Precision Manufacturing and how it allows A ...
Applied Materials - Autolign CA 3400 Mask Aligner :1980-84 - The remnants of a f ...
Silicon Valley Group - Model 8800 ATS Track (Arm Transport System)
Veeco - Flexible Automated Wafer Fab System - Increased productivity, Improve yi ...
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