Summary : A precursor to the excimer laser. But it was solely for X-ray wavelengths. It was an essential part of the infrastructure developed for a Next Generation Lithography technology that never materialized for other reasons.
The semiconductor industry has always worked hard to have and to maintain extrem ...
The DWL 2.0 has been designed with a modular concept in order to ensure maximum ...
Not the first such system, but near the first.
High Voltage Engineering shipped the first commercial Ion Implanter, built in 19 ...
Rare captively made stepper with a Minolta Lens.
Applied Materials - SPCVD-4000 :1960s - An LPCVD tool from a time when Applied c ...
Yan Borodovsky discusses DFM and Computational Lithography at Intel in historic ...
Mihir Parikh tells us about the big Automation Do's and Don'ts
APT - 9155 E-Beam Resist Processor :1985-89
Sean Maloney, who heads up Intel’s Mobility Group, talks about its new duo, 65 ...
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