Summary : A precursor to the excimer laser. But it was solely for X-ray wavelengths. It was an essential part of the infrastructure developed for a Next Generation Lithography technology that never materialized for other reasons.
In 1968, standard clean room practices were lax. Facilities were kept reasonably ...
8008- 8 bit parallel central proccessing unit.
Craig describes the origins of manufacturing lore such as Copy Exactly, Intel U, ...
The Drytek DRIE 100 plasma etcher was the template for all cluster tools that wo ...
Dave Markle, Senior Vice President & Chief Technical Officer at Ultratech, descr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
Applied Materials - CA-800 Mask Aligner and Exposure System: :1980-84
Yan Borodovsky discusses DFM and Computational Lithography at Intel in historic ...
The model P 3201 is a low cost, highly efficient dip coating system customarily ...
Irie Seisakusho - Spin Drier
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