Summary : A precursor to the excimer laser. But it was solely for X-ray wavelengths. It was an essential part of the infrastructure developed for a Next Generation Lithography technology that never materialized for other reasons.
The tool that sparked the yield management revolution.
In the final installment of this three-part interview, Jim Morgan expands on the ...
Dave Markle, Senior Vice President & Chief Technical Officer at Ultratech, descr ...
BTU - Bruce Diffusion Furnaces :1980-84 - A Real Workhorse from the Early Days.
Technology, Circa 1991 – As lithography moved into ever lower k factors, the c ...
The 8050 yields consistent, repeatable wafer-to-wafer results, providing maximum ...
ASET - Model 1562 g-Line Stepper :1985-89 - Once a leader, they died after Japan ...
The child of the legendary Cambridge maskless systems.
Applied Materials - Silox Model AMS 1200 :1960s - Wafers were laid out by hand i ...
Bill Holt on Business Incentives for Semiconductor R&D
Copyright © 2018 VLSI Research Inc. All rights reserved.