Ultratech - Positive Resist Develop/Rinse Station Model 504

Organization Name :Ultratech (Formerly Ultratech Stepper)

Summary : Ultratech - Positive Resist Develop/Rinse Station Model 504 - For automatic batch developing and rinsing positive resist on wafers and photomasks

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Proximity aligners were a bridge tool between the original contact aligners and projection aligners. Yield from contact aligners was extremely low, mainly because the mask was just a stencil laying over the pho ... See more