Ultratech - Positive Resist Develop/Rinse Station Model 504

Ultratech Stepper - Model 900 H/G Line stepper - Versatile, Adaptable, Flexible

Saturn wafer stepper Advancing Mix-and-Match Lithography

Dave Markle, Senior Vice President & Chief Technical Officer at Ultratech, descr ...

Ultratech - Pellicle Equipment and Accessories - To implement the use of pellicl ...

Ultratech - Model 504 Resist Develop/Rinse System - Positive photo resist Develo ...

Ultratech - Positive Photoresist Develop Station Model 503

This system, from about 1988, represents one of the most successful tungsten dep ...

An early excimer laser stepper for 0.45 micron.

BTU - Bruce Diffusion Furnaces :1980-84 - A Real Workhorse from the Early Days.

Lam Research Corporation was founded in 1980 when advance in micro miniaturizati ...