Martin van den Brink — All Star 2020

Summary : Martin van den Brink: EUV is reality and extends Moore’s law down to 3nm; the world needs Hi-NA EUV nodes beyond 3nm and Martin continues to drive Lithography ecosystem to deliver it
Martin van den Brink — All Star 2020
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Martin van den Brink — All Star 2020: EUV is reality and extends Moore’s law down to 3nm; the world needs Hi-NA EUV nodes beyond 3nm and Martin continues to drive Lithography ecosystem to deliver it

  • Martin and his team have the track record and capability to work through the lithography ecosystem and partner in R&D to provide timely insertion for 2nm production
  • His leadership is absolutely critical for semiconductors to reach $1T in revenues and to drive Wafer Fab Equipment into a $100B industry
    • Transistor cost reductions are largely achieved through breakthroughs in lithography

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