Lithography Panel 2007: Audience Q&A

Interviewed :Gene Fuller, Phil Ware, Bill Arnold, AudienceRelevant Date :2007-11-05

Summary : Lithography Panel 2007: Audience Q&A

Annexure : This is the year of immersion. It's moved to manufacturing and EUV seems closer than ever before. Find out the latest trends in lithography for semiconductor manufacturing of future technology for tomorrow's nanochips, which are plunging to dimensions of 32nm and below. It covers high-refractive index materials, inverse lithography, double patterning, imprint lithography, and more. Hear the world's top experts from the leading scanner manufacturers debate what's hot and what's not . . .

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