Lithography Panel 2007: Audience Q&A

Summary : Lithography Panel 2007: Audience Q&A
Annexure : This is the year of immersion. It's moved to manufacturing and EUV seems closer than ever before. Find out the latest trends in lithography for semiconductor manufacturing of future technology for tomorrow's nanochips, which are plunging to dimensions of 32nm and below. It covers high-refractive index materials, inverse lithography, double patterning, imprint lithography, and more. Hear the world's top experts from the leading scanner manufacturers debate what's hot and what's not . . .

You may like this also:

Jim Morgan
Bringing Focus to AMAT
07 Mar 2006
Bringing Focus to AMAT

Jim Morgan talks about the early days of Applied Materials; how he brought focus ...

Jim Morgan talks about the early days of Applied Materials; how he brought focus by paring down the company's business to the core epitaxy product line; his concept of success; and the three phases of competiti ... See more

Jim Bowen
Lessons Learned at Fair ...
18 Jan 2006
Lessons Learned at Fair ...

Jim Bowen talks about how he took Fairchild Test Systems Group from a money lose ...

Jim Bowen talks about how he took Fairchild Test Systems Group from a money loser to the world's largest semiconductor equipment company during the seventies and how mismanagement led to its destruction after h ... See more

Jim Morgan
Keys to Success
23 Mar 2006
Keys to Success

In the final installment of this three-part interview, Jim Morgan expands on the ...

In the final installment of this three-part interview, Jim Morgan expands on the strategies that made AMAT the successful company it is today. Topics covered include why perseverance works; balancing Kaizen m ... See more

John Bardeen
John Bardeen and Transi ...
25 Apr 2007
John Bardeen and Transi ...

John Bardeen and Transistor Physics by Howard R. Huff, International SEMATECH

John Bardeen and Transistor Physics by Howard R. Huff, International SEMATECH ... See more

Aart de Geus
Current Trends in EDA
05 Dec 2006
Current Trends in EDA

Aart de Geus: Chairman & CEO, Synopsys: Current Trends in EDA

Aart de Geus: Chairman & CEO, Synopsys: Current Trends in EDA ... See more

G. Dan Hutcheson
The Shifting Winds of P ...
30 Apr 2008
The Shifting Winds of P ...

G. Dan Hutcheson: CEO of VLSI Research Inc: The Shifting Winds of Power

G. Dan Hutcheson: CEO of VLSI Research Inc: The Shifting Winds of Power ... See more

Chiang Yang
Chiang Yang on Whatâ₠...
18 Oct 2006
Chiang Yang on Whatâ₠...

Intel's Chiang Yang talks about what's new in photomask technology and how Intel ...

Intel's Chiang Yang talks about what's new in photomask technology and how Intel Mask Operation (IMO) gives it competitive advantage in this 2006 Interview He describes the latest in Reticle Enhancement Technol ... See more

Hans Stork on Low-k Interc ...
Low-k Interconnect Mate ...
18 Jul 2003
Low-k Interconnect Mate ...

In this historic 2003 video, Hans Stork discusses the status of Low-k Interconne ...

In this historic 2003 video, Hans Stork discusses the status of Low-k Interconnect Materials for semiconductor metal layers. ... See more

Dave Anderson
What ATDF’s All ...
07 Sep 2006
What ATDF’s All ...

Dave Anderson: General Manager, ATDF: What ATDF’s All About

Dave Anderson: General Manager, ATDF: What ATDF’s All About ... See more

Mark Bohr
Hi-k and Metal Gates
02 Feb 2007
Hi-k and Metal Gates

Mark Bohr: Intel Senior Fellow, Director of Process Architecture & Integration: ...

Mark Bohr: Intel Senior Fellow, Director of Process Architecture & Integration: Hi-k and Metal Gates ... See more

Access to and use of this Website is subject to VLSI's Terms of Use (including Copyright Policy & Claims) and Privacy Policy. By accessing or using this Website you agree to VLSI's Terms of Use (including Copyright Policy & Claims) and Privacy Policy.

Copyright © 2021 VLSI Research Inc. All rights reserved.