Lithography Panel 2006: Audience Q&A

Interviewed :Phil Ware, Bill Arnold, Gene FullerRelevant Date :2006-10-31

Summary : Find out the latest lithography trends and future technology for the semiconductor manufacturing of tomorrows nanochips, which are plunging to dimensions of 32nm and below.

Annexure :

Find out the latest lithography trends and future technology for the semiconductor manufacturing of tomorrow's nanochips, which are plunging to dimensions of 32nm and below. The world's top experts from the leading scanner manufacturers debate what's hot and what's not . . .

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Andre Auberton-Herve

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Chandra Mouli

21 Mar 2006

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Bill Arnold

31 Oct 2006

Lithography Panel 2006: ...

Bill Arnold draws on a wealth of knowledge gleaned from having lots of immersion lithography tools in the field ... See more

Bill Arnold, Gene Fuller, ...

22 Oct 2003

Dateline 2003 - Highest ...

What are the highest Numerical Apertures and k-factors that can be achieved with 193nm lithography for use in manufacturing semiconductors? ... See more