Lithography Panel 2006: Audience Q&A

Interviewed :Phil Ware, Bill Arnold, Gene FullerRelevant Date :2016-12-21

Summary : Find out the latest lithography trends and future technology for the semiconductor manufacturing of tomorrows nanochips, which are plunging to dimensions of 32nm and below.

Annexure :

Find out the latest lithography trends and future technology for the semiconductor manufacturing of tomorrow's nanochips, which are plunging to dimensions of 32nm and below. The world's top experts from the leading scanner manufacturers debate what's hot and what's not . . .

Nat Cieglio

01 Jan 1988

Nat Ceglio: EUV Pioneer

Nat was one of the prime movers of EUV and without his perseverance, EUV may never have happened. ... See more

Andre Auberton-Herve

26 Feb 2004

Soitec's SOI Roadmap

Andre Auberton-Herve: President & CEO, Soitec: Soitec's SOI Roadmap ... See more

Bill Arnold

07 Dec 2005

Lithography Panel on Im ...

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Martin van den Brink

10 Jul 2006

Martin van den Brink

Martin van den Brink on 193nm Immersion Lithography ... See more

Gene Fuller, Phil Ware, Bi ...

22 Oct 2003

Semiconductor lithograp ...

Will 193nm Immersion lithography work? ... See more

Bill Arnold, Gene Fuller, ...

07 Dec 2005

Lithography Panel 2005: ...

Lithography Panel 2005: Audience Q&A on... 32nm: Immersion or EUV? ... See more

Gene Fuller

16 Nov 2004

Lithography Panel 2004: ...

Lithography Panel: Gene Fuller, Nikon on... Immersion Lithography ... See more

Phil Ware

21 Dec 2006

Lithography Panel 2006: ...

Canon's Phil Ware discusses the issues surrounding the various lithography alternatives as nanochips plunge to dimensions of 32nm and below ... See more