Summary : Canon's Phil Ware discusses the issues surrounding the various lithography alternatives as nanochips plunge to dimensions of 32nm and below
Annexure :
In this video, Canon's Phil Ware discusses the issues surrounding the various lithography alternatives as nanochips plunge to dimensions of 32nm and below. Where will the world go: EUV, double patterning, or hyper-NA? What are issues facing each and which is likely to win? Phil's got a great track record for predicting technical developments and he's always interesting . . .
