Lithography Panel 2006: Phil Ware, Canon

Interviewed :Phil WareRelevant Date :2006-12-21

Summary : Canon's Phil Ware discusses the issues surrounding the various lithography alternatives as nanochips plunge to dimensions of 32nm and below

Annexure :

In this video, Canon's Phil Ware discusses the issues surrounding the various lithography alternatives as nanochips plunge to dimensions of 32nm and below. Where will the world go: EUV, double patterning, or hyper-NA? What are issues facing each and which is likely to win? Phil's got a great track record for predicting technical developments and he's always interesting . . .

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