Lithography Panel 2006: Gene Fuller, Nikon

Interviewed :Gene FullerRelevant Date :2016-12-21

Summary : Gene Fuller covers the latest progress in lithography at Nikon in both immersion and EUV.

Annexure :

In this video, Gene Fuller covers the latest progress in lithography at Nikon in both immersion and EUV. He boldly explains why 193nm is the end-of-the-road for shorter wavelengths when it comes to conventional optics. Fortunately, Nikon has made significant progress in EUV, where he talks about the latest results from a new lens. He covers the key issues regarding double patterning with immersion as well . . .

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