Summary : Martin van den Brink on 193nm Immersion Lithography
Martin van den Brink, then Executive Vice President Marketing & Technology of ASML, describes what's new in Immersion Lithography in this 2006 interview. They were formally introducing a barrier shattering 1.35 Numerical Aperture (NA) scanner called the XT: 1900i. Martin tells what it is all about and what it does for chip making.
Do design rules make it easier for chip engineers in a semiconductor wafer fab? ...
Do design rules make it easier for chip engineers in a semiconductor wafer fab? In this historic 2003 Lithography Panel of experts, Bill Arnold, Gene Fuller, and Phil Ware discuss the issue. ... See more