Martin van den Brink

Andre Auberton-Herve: President & CEO, Soitec: Soitec's SOI Roadmap

Bill Arnold of ASML discusses Immersion Lithography in this 2004 panel.

Lithography Panel: Bill Arnold, ASML on the question of Immersion vs. EUV at 32n ...

Bill Arnold draws on a wealth of knowledge gleaned from having lots of immersion ...

Will 193nm Immersion lithography work?

Lithography Panel Q&A with Bill Arnold, Gene Fuller, and Phil Ware.

Phil Ware discusses Immersion Lithography in this 2004 panel.

Gene Fuller covers the latest progress in lithography at Nikon in both immersion ...

Gene Fuller and his views about the future of semiconductor lithography in 2003.

Do design rules make it easier for chip engineers in a semiconductor wafer fab? ...