Lithography Panel: Gene Fuller of Nikon on Immersion vs. EUV at 32nm

Summary : Lithography Panel: Gene Fuller of Nikon on Immersion vs. EUV at 32nm
Annexure :

Gene Fuller discusses Nikon's strategy for introducing Immersion Lithography to semiconductor manufacturing in this historic 2005 panel.  Topics covered include:readiness of EUV. When might it arrive to manufacturing. Readiness of immersion lithography. Numerical apertures, what fluids will be used and more.

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