Lithography Panel on Immersion vs. EUV at 32nm

Summary : Lithography Panel: Bill Arnold, ASML on the question of Immersion vs. EUV at 32nm
Annexure :

Bill Arnold discusses ASML's strategy for introducing EUV and Immersion Lithography to semiconductor manufacturing in this historic 2005 panel.  Topics covered include:readiness of EUV. When might it arrive to manufacturing. Readiness of immersion lithography. Numerical apertures, what fluids will be used and more.

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