The role for E-beam maskless lithography

Interviewed :Hans Stork on the role for E-beam maskless lithography for low-volume semiconductor manufacturingTime Period :2000'sRelevant Date :2003-07-18

Summary : Hans Stork addresses the role E-beam maskless lithography for low-volume semiconductor manufacturing in this historic 2003 video. Topics covered include: why the role for maskless lithography is not large: Costs versus volume and how mask costs play off against technology maturity.

Jim Morgan

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Keys to Success

In the final installment of this three-part interview, Jim Morgan expands on the strategies that made AMAT the successful company it is today. Topics covered include why perseverance works; balancing Kaizen m ... See more

Peter Rose

29 Nov 2004

Peter Rose: Father of I ...

How he turned a technology, critial to the future of Moore's Law and the semiconductor industry, into a success. ... See more

Sunlin Chou: A tribute

05 Dec 2018

Sunlin Chou: A tribute

Sunlin Chou, who passed December 5th, 2018, and his contributions to the semiconductor industry. Sunlin’s role was to develop a new business model for research and development. ... See more

Bernie Meyerson

05 Nov 2003

When Simple IC Scaling ...

In 2003, Bernie Meyerson, CTO at IBM's Microelectronics Division, shocked the world, exclaiming, “Scaling is dead!” In this historic video, he describes how he saw the end simple lithographic scaling of int ... See more