The role for E-beam maskless lithography

Interviewed :Hans Stork on the role for E-beam maskless lithography for low-volume semiconductor manufacturingTime Period :2000'sRelevant Date :2003-07-18

Summary : Hans Stork addresses the role E-beam maskless lithography for low-volume semiconductor manufacturing in this historic 2003 video. Topics covered include: why the role for maskless lithography is not large: Costs versus volume and how mask costs play off against technology maturity.

Toshio Maruyama

05 Jan 2006

Advantest: What made it ...

Toshio Maruyama reflects on the history and future of Advantest and its role in semiconductor ATE. ... See more

Rick Wallace

10 Jul 2007

KLA-Tencor and Accelera ...

Rick Wallace: CEO, KLA-Tencor: KLA-Tencor and Accelerating the 45nm Yield Ramp ... See more

Sunlin Chou

05 Oct 2004

Intel's R&D Pipeline

The history of semiconductor research at Intel is discussed in this 2004 conversation with Sunlin Chou. ... See more

Jim Bowen

12 Jan 2006

Building Fairchild Test ...

Jim Bowen talks about how he took Fairchild Test Systems Group from a money loser to the world's largest semiconductor equipment company during the seventies and how mismanagement led to its destruction after h ... See more

Bob Graham

29 Nov 2004

The Bob Graham Award

What About Bob - Robert Graham's video biography of his career with comments about him, sometimes roasting him, from industry luminaries such as Gordon Moore, Marshall Cox, Mel Phelps, and G. Dan Hutcheson. ... See more

Bernie Meyerson

05 Nov 2003

When Simple IC Scaling ...

In 2003, Bernie Meyerson, CTO at IBM's Microelectronics Division, shocked the world, exclaiming, “Scaling is dead!” In this historic video, he describes how he saw the end simple lithographic scaling of int ... See more