Lithography Panel 2004: Audience Q&A

Summary : Lithography Panel Q&A with Bill Arnold, Gene Fuller, and Phil Ware.
Annexure :

Lithography Panel Audience Q&A with Bill Arnold, Gene Fuller, and Phil Ware answer questions such as plans for a KrF immersion lithography tool. Clarify i-line at 280nm. What is the upper limit of NA achievable with immersion. What is the likelihood of extending immersion. When to expect a production immersion tool with a NA >1.

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