Lithography Panel 2004: Gene Fuller

Summary : Lithography Panel: Gene Fuller, Nikon on... Immersion Lithography
Annexure :

Gene Fuller discusses Immersion Lithography in this 2004 panel. Topics covered include: Nikon’s early results in immersion lithography are covered. How long dry ArF will last in semiconductor production. How a new technology node ramps from early R&D to volume. The big question of immersion’s path. DoF improvement by multiples.

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