In this 2003 Lithography Panel of experts, Bill Arnold, Gene Fuller, and Phil Ware discuss then current views of the future of 193nm Numerical Apertures and k-factors for use in manufacturing semiconductors.
Lithography Panel Q&A with Bill Arnold, Gene Fuller, and Phil Ware.
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Bill Arnold and his views about the future of semiconductor lithography in 2003.
Bill Arnold of ASML discusses Immersion Lithography in this 2004 panel.
Gene Fuller and his views about the future of semiconductor lithography in 2003.
Lithography Panel: Mick Fukuda of Canon on Immersion vs. EUV at 32nm
Phil Ware discusses Immersion Lithography in this 2004 panel.
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