In this 2003 Lithography Panel of experts, Bill Arnold, Gene Fuller, and Phil Ware discuss then current views of the future of 193nm Numerical Apertures and k-factors for use in manufacturing semiconductors.
Are Semiconductor Lithography Enhancing Technology options narrowing?
Lithography Panel Q&A with Bill Arnold, Gene Fuller, and Phil Ware.
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Will 193nm Immersion lithography work?
A tribute to Ken Schroeder • One of those rare individuals who without, ...
Bill Arnold draws on a wealth of knowledge gleaned from having lots of immersion ...
Gene Fuller and his views about the future of semiconductor lithography in 2003.
Martin van den Brink on 193nm Immersion Lithography
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Phil Ware discusses Immersion Lithography in this 2004 panel.
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