Will a NGL emerge before EUV?

Interviewed :Bill Arnold, Gene Fuller, Phil WareRelevant Date :2013-10-22

Summary : Will there be a new wafer exposure technology before EUV makes it to production? Some Next Generation Lithography? In this historic video from 2003, Lithography experts, Bill Arnold, Gene Fuller, and Phil Ware discuss the issue. At the time, 193nm scanner

Bill Arnold, Gene Fuller, ...

22 Oct 2003

How is revenue recogniz ...

Chip execs, Bill Arnold, Gene Fuller, and Phil Ware weigh in on the then new FASB accounting standards for revenue recognition that affect semiconductor equipment companies. At the time it created lots of issue ... See more

John Bardeen

25 Apr 2007

John Bardeen and Transi ...

John Bardeen and Transistor Physics by Howard R. Huff, International SEMATECH ... See more

Bill Holt

21 Jan 2008

Decision Making at Inte ...

Bill Holt on Business Incentives for Semiconductor R&D ... See more

Andrew Hazelton, Phil Ware ...

18 Nov 2008

Lithography Panel 2008: ...

Lithography Panel 2008: Audience Q&A ... See more

Jim Morgan

16 Mar 2006

Building a Global Posit ...

The second part of this three-part interview covers Applied Materials in the 1980s and its transformation into a global company. Jim Morgan talks about Japan, the Rule of Three, SEMI, and his vision of a globa ... See more

Brian M. Krzanich

24 Jun 2008

Manufacturing at Intel

Brian M. Krzanich: VP & GM of Manufacturing & Supply Chain, Intel: Manufacturing at Intel ... See more

Robert N. Noyce

11 Jun 2008

Legends, Circa 1990 - R ...

This Electronic News article remembers the man who more than anyone else, made the silicon valley legend a reality. Today, electronic name only. Yet its tradition of excellence continues in the consolidate web ... See more