Will a NGL emerge before EUV?

Interviewed :Bill Arnold, Gene Fuller, Phil WareRelevant Date :2013-10-22

Summary : Will there be a new wafer exposure technology before EUV makes it to production? Some Next Generation Lithography? In this historic video from 2003, Lithography experts, Bill Arnold, Gene Fuller, and Phil Ware discuss the issue. At the time, 193nm scanner

Bill Arnold, Gene Fuller, ...

22 Oct 2003

How is revenue recogniz ...

Chip execs, Bill Arnold, Gene Fuller, and Phil Ware weigh in on the then new FASB accounting standards for revenue recognition that affect semiconductor equipment companies. At the time it created lots of issue ... See more

Art Zafiropoulo

29 Nov 2004

Art Zafiropoulo and his ...

Art Zafiropoulo was honored for championing technology through innovative marketing approaches: first with plasma etching and later with “mix and match” lithographic manufacturing strategies. ... See more

Anantha Sethuraman

01 Jul 2008

Introducing DFMSim

Anantha Sethuraman: CEO of DFMSim: Introducing DFMSim ... See more

G. Dan Hutcheson

15 Nov 2006

Moore's Law and the rac ...

How the continuation of Moore’s law provides a foundation for future economic growth; how it’s broken down the red brick walls in its path; what barriers are believed to loom today; how they might be releva ... See more

B. Price

29 Mar 2005

Test Panel: B. Price, P ...

Test Panel: B. Price, Philips on... Open Architecture ... See more

Hans Stork on Low-k Interc ...

18 Jul 2003

Low-k Interconnect Mate ...

In this historic 2003 video, Hans Stork discusses the status of Low-k Interconnect Materials for semiconductor metal layers. ... See more

Steve Nakayama

29 Nov 2004

2003: Steve Nakayama

Steve Nakayama honored for his contribution in helping globalize the semiconductor equipment industry. He talks about how ITPC got started and the methods he used to convince Japanese semiconductor executives t ... See more