Will a NGL emerge before EUV?

Interviewed :Bill Arnold, Gene Fuller, Phil WareRelevant Date :2013-10-22

Summary : Will there be a new wafer exposure technology before EUV makes it to production? Some Next Generation Lithography? In this historic video from 2003, Lithography experts, Bill Arnold, Gene Fuller, and Phil Ware discuss the issue. At the time, 193nm scanner

Bill Arnold, Gene Fuller, ...

22 Oct 2003

How is revenue recogniz ...

Chip execs, Bill Arnold, Gene Fuller, and Phil Ware weigh in on the then new FASB accounting standards for revenue recognition that affect semiconductor equipment companies. At the time it created lots of issue ... See more

Wilf Corrigan

16 May 2007

How the SIA Got Started

How the SIA got started is an video interview with the legendary Wilf Corrigan who was there when this soon-to-be-great organization got started. ... See more

Kumud Srinivasan

04 Jun 2004

Kumud Srinivasan on Fab ...

Kumud Srinivasan, Director of Fab Automation, Intel discusses the status of Semiconductor Fab Automation at Intel in this 2004 interview. Find out where Intel was at the time and what it saw ahead in fab autom ... See more

Mark Bohr

24 Oct 2005

Intel moves 65nm to man ...

Mark Bohr, Intel Senior Fellow, Technology and Manufacturing Group discusses moving Intel's 65nm process technology to manufacturing in this 2005 interview. ... See more