Will a NGL emerge before EUV?

Interviewed :Bill Arnold, Gene Fuller, Phil WareRelevant Date :2013-10-22

Summary : Will there be a new wafer exposure technology before EUV makes it to production? Some Next Generation Lithography? In this historic video from 2003, Lithography experts, Bill Arnold, Gene Fuller, and Phil Ware discuss the issue. At the time, 193nm scanner

Bill Arnold, Gene Fuller, ...

22 Oct 2003

How is revenue recogniz ...

Chip execs, Bill Arnold, Gene Fuller, and Phil Ware weigh in on the then new FASB accounting standards for revenue recognition that affect semiconductor equipment companies. At the time it created lots of issue ... See more

Sunlin Chou: A tribute

05 Dec 2018

Sunlin Chou: A tribute

Sunlin Chou, who passed December 5th, 2018, and his contributions to the semiconductor industry. Sunlin’s role was to develop a new business model for research and development. ... See more

Mark Jagiela

12 Aug 2003

The Move to an Open Arc ...

Mark Jagiela, President of Teradyne's Semiconductor ATE Group, on what will be the prevailing tester architecture. Semiconductor History being made in the 2000’s: a historic video from 2003. ... See more

Charlie Sporck

17 Oct 2007

Going Off-Shore

Semiconductors were starting to become big business by the mid-sixties. Assembly was the bulk of the cost and the giants in Japan and the Southwest were building automated assembly lines to deal with the cost. ... See more

Peo Hansson

14 May 2008

Performance Improvement ...

Peo Hansson: General Manager of ASM America, Inc.: Performance Improvements in Semiconductors ... See more

Kumud Srinivasan

04 Jun 2004

Kumud Srinivasan on Fab ...

Kumud Srinivasan, Director of Fab Automation, Intel discusses the status of Semiconductor Fab Automation at Intel in this 2004 interview. Find out where Intel was at the time and what it saw ahead in fab autom ... See more

Scott Kulicke

04 Mar 2004

Assembly & Packaging Ch ...

Scott Kulicke, discusses the challenges going forward in semiconductor packaging and assembly in this 2004 interview. Topics covered include: productivity, effect of new wafer fab processes, early efforts to re ... See more

Chiang Yang

18 Oct 2006

Chiang Yang on What’s ...

Intel's Chiang Yang talks about what's new in photomask technology and how Intel Mask Operation (IMO) gives it competitive advantage in this 2006 Interview He describes the latest in Reticle Enhancement Technol ... See more