Will a NGL emerge before EUV?

Interviewed :Bill Arnold, Gene Fuller, Phil WareRelevant Date :2013-10-22

Summary : Will there be a new wafer exposure technology before EUV makes it to production? Some Next Generation Lithography? In this historic video from 2003, Lithography experts, Bill Arnold, Gene Fuller, and Phil Ware discuss the issue. At the time, 193nm scanner

Bill Arnold, Gene Fuller, ...

22 Oct 2003

How is revenue recogniz ...

Chip execs, Bill Arnold, Gene Fuller, and Phil Ware weigh in on the then new FASB accounting standards for revenue recognition that affect semiconductor equipment companies. At the time it created lots of issue ... See more

Toshio Maruyama

05 Jan 2006

Advantest: What made it ...

Toshio Maruyama reflects on the history and future of Advantest and its role in semiconductor ATE. ... See more

Kazuo Ushida

14 Jul 2008

Advancing Nano-Lithogra ...

Kazuo Ushida: President, Nikon Precision Equipment Company: Advancing Nano-Lithography ... See more

Peter Rose

29 Nov 2004

Peter Rose: Father of I ...

How he turned a technology, critial to the future of Moore's Law and the semiconductor industry, into a success. ... See more

Barry Rapozo

29 Nov 2004

Barry Rapozo and his 20 ...

Barry Rapozo was honored for the establishment of selling processes in wafer fab. He identified and met our industry specific customer needs and brought these selling processes into theindustry. ... See more