Will a NGL emerge before EUV?

Interviewed :Bill Arnold, Gene Fuller, Phil WareRelevant Date :2013-10-22

Summary : Will there be a new wafer exposure technology before EUV makes it to production? Some Next Generation Lithography? In this historic video from 2003, Lithography experts, Bill Arnold, Gene Fuller, and Phil Ware discuss the issue. At the time, 193nm scanner

Bill Arnold, Gene Fuller, ...

22 Oct 2003

How is revenue recogniz ...

Chip execs, Bill Arnold, Gene Fuller, and Phil Ware weigh in on the then new FASB accounting standards for revenue recognition that affect semiconductor equipment companies. At the time it created lots of issue ... See more

Martin van den Brink

26 Jul 2006

The Rise of ASML

Martin van den Brink, employee number 1 at ASML, describes what it's been like to take on Japan's giants and win. ... See more

Jim Morgan

23 Mar 2006

Keys to Success

In the final installment of this three-part interview, Jim Morgan expands on the strategies that made AMAT the successful company it is today. Topics covered include why perseverance works; balancing Kaizen m ... See more

Rick Wallace

10 Jul 2007

KLA-Tencor and Accelera ...

Rick Wallace: CEO, KLA-Tencor: KLA-Tencor and Accelerating the 45nm Yield Ramp ... See more

Dan Maydan

01 Dec 2005

Building Applied Materi ...

Dan Maydan talks about how Applied Materials built it into a multi-billion dollar, multi-product company ... See more

Kumud Srinivasan

04 Jun 2004

Kumud Srinivasan on Fab ...

Kumud Srinivasan, Director of Fab Automation, Intel discusses the status of Semiconductor Fab Automation at Intel in this 2004 interview. Find out where Intel was at the time and what it saw ahead in fab autom ... See more