Summary : Do design rules make it easier for chip engineers in a semiconductor wafer fab? In this historic 2003 Lithography Panel of experts, Bill Arnold, Gene Fuller, and Phil Ware discuss the issue.
Will 193nm Immersion lithography work?
The stepper was one of the most important tools that would propel Moore's Law fo ...
Art Zafiropoulo: Chairman & CEO of Ultratech: Ultratech's Vision of the Future
Andre Auberton-Herve: President & CEO, Soitec: Soitec's SOI Roadmap
Bill Arnold draws on a wealth of knowledge gleaned from having lots of immersion ...
What are the highest Numerical Apertures and k-factors that can be achieved with ...
Are Semiconductor Lithography Enhancing Technology options narrowing?
Lithography Panel: Gene Fuller of Nikon on Immersion vs. EUV at 32nm
Phil Ware discusses Immersion Lithography in this 2004 panel.
Lithography Panel: Mick Fukuda of Canon on Immersion vs. EUV at 32nm
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