In this 2003 Lithography Panel of experts, Bill Arnold, Gene Fuller, and Phil Ware discuss then current views of the possibility that 193nm immersion lithography might not work for manufacturing semiconductors. This is years before the technology would be in high volume manufacturing.
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Phil Ware and his views about the future of semiconductor lithography in 2003.
Gene Fuller and his views about the future of semiconductor lithography in 2003.
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