Semiconductor lithography history: dateline 2003 - Phil Ware

Summary : Phil Ware and his views about the future of semiconductor lithography in 2003.
Annexure :

The history of technology development always looks like a clear linear path in retrospect. But it’s never clear when you’re in the middle of it. This historic video takes you back to 2003, when 193nm immersion was still a concept, 157nm exposure tools were expected to be ready soon, and progress on EUV was extremely difficult.

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