Summary : Mark Bohr, Intel Fellow, Director of Process Architecture and Integration discusses the launch of Intel's then new P1262 90nm Process in this historic interview. In 2002, 90nm was the cutting edge of semiconductor process technology. It marks the point where the semiconductor industry made the transition from microchips to nanochips, as it took (integrated circuit) IC well below the 100 nanometer barrier defining where nanotechnology starts.
Annexure :
It’s 2002… Intel will become the first to crack 90nm, making semiconductors the first nanotechnology industry of scale. These integrated circuits or ICs were well past the 100-nanometer border that that defines where nanotechnology starts. Thus, Intel was leading the industry from microchips to nanochips. It would take a lot of manufacturing breakthroughs for the team of engineers and scientists at Intel to pull this off, including SiGe. In doing so, it would raise Intel TMG into the pantheon of legendary solid-state research centers. Mark Bohr, Intel Fellow, Director of Process Architecture and Integration discusses the launch of Intel's then new P1262 90nm Process in this historic interview.