1981: HP announces
300MHz machine. Promises 30 WPH.
Achieves 1-3
WPH. IBM Discloses EL-3 using Variable
Shaped Beam and Vector
Scan. Promises 10-20 WPH @ 1m . But, reality is 1-2 WPH.
1983: At ISSCC, representatives of
both Japanese and American manufacturers agree that 0.5 microns is the
limit. E-beam DW will probably never be needed. But ASICs gather steam.
1984: ETEC
introduces AEBLE 150 Direct Write.
Promises to hit viability
threshold of 20 WPH. But eventually
drops to 1 WPH spec.
1987: E-beam
Direct Write has fallen into disrepute.
So has X-Ray and
Ion-Beam. NGL is used primarily as
counter-intelligence.
1992: ETEC starts quietly talking about multi-beam cathode array.