August,
99
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Historical Perspectives
E-Beam
Early 60’s: 1st
demo’s at Cambridge and Tubingen Universities.
Early commercial work starts at TI, Hughes, Bell Labs.
1969: JEOL and Cambridge Instruments offer First Commercial Equipment.
1974: Bell Labs announces MEBES Mask Exposure System. Licenses to ETEC. TI
starts internal production of mask writer.
1976: IBM announces EL1. JOEL JBX-6A
emerges from Japan’s VLSI Technology
Research Program.
1980: E-Beam
becomes standard for mask production.
RCA study shows e-beam
masks yield higher. VLSI Research CoO
model shows 20 WPH is threshold
of economic viability for Direct Write.
1980: Veeco acquires rights to SRI Fly’s Eye e-beam Direct Write technology.
Control Data announces Multi-Beam System.