Martin van den Brink — All Star 2020

Summary : Martin van den Brink: EUV is reality and extends Moore’s law down to 3nm; the world needs Hi-NA EUV nodes beyond 3nm and Martin continues to drive Lithography ecosystem to deliver it

Martin van den Brink — All Star 2020: EUV is reality and extends Moore’s law down to 3nm; the world needs Hi-NA EUV nodes beyond 3nm and Martin continues to drive Lithography ecosystem to deliver it

Martin and his team have the track record and capability to work through the lithography ecosystem and partner in R&D to provide timely insertion for 2nm production
His leadership is absolutely critical for semiconductors to reach $1T in revenues and to drive Wafer Fab Equipment into a $100B industry

Transistor cost reductions are largely achieved through breakthroughs in lithography

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