Summary : Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask.
This technical paper laid out the future of yield management, covering all the i ...
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
The tool that sparked the yield management revolution.
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
The APTCON 3000 is a modular spin processing system designed by APT and CONVAC, ...
Yan Borodovsky discusses DFM and Computational Lithography at Intel in historic ...
Applied Materials - Nitrox AMN-710 :1960s - Improved yields by sealing oxide pin ...
Cambridge Instruments - EBML 300 :1985-89 - Maskless Lithography from twenty yea ...
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