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Wafer Cleaning was the continual Achilles’ heel
of the semiconductor industry. Removing the debris and detritus from
the wafer surface prior to the next deposition was particularly
vexing; even dried water spots could destroy a good run. Brush
cleaning was the preferred method but it left scratch damage to the
surface.
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Industry code: 1474.325 |
No Discernible
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Mfr’s Code: Obsolete |